The Double Bend Filtered Cathodic Arc Technology and Its Applications

Xu, Shaohui; Tay, Beng Kang; Lau, Shu Ping

doi:10.1142/s0217979200000145

Cited by 78 publications

(60 citation statements)

References 11 publications

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“…The efficiency of the removal of macroparticles can also be improved using an S-bend magnetic filter, although it decreases the deposition rates due to reduced iontransport efficiency. [12][13][14][15][16][17] The pulsed mode of the plasma also allows better filtering of the macroparticle because the ions tend to be entrained in the plasma beam during the pulse but fall out of the plasma when the beam stops. [18][19][20][21][22] All these processes mentioned above are highly energetic processes, and the control of ion energy leads to the variation in the material properties.…”

Section: Introductionmentioning

confidence: 99%

Effect of high substrate bias and hydrogen and nitrogen incorporation on density of states and field-emission threshold in tetrahedral amorphous carbon films

Panwar

Khan

Satyanarayana³

et al. 2010

Journal of Vacuum Science &Amp; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phen

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This article reports the influence of substrate bias during growth and of hydrogen and nitrogen incorporation on density of states ͓N ͑E F ͔͒ and field-emission threshold ͑E turn-on ͒ in tetrahedral amorphous carbon ͑ta-C͒ films, deposited using an S-bend filtered cathodic vacuum arc process. The variation in negative substrate bias from Ϫ20 to Ϫ200 V was found to initially lead to a small decrease in N ͑E F ͒ and E turn-on , and a small increase in the emission current density ͑J͒ at 12.5 V / m in the case of as-grown ta-C films; beyond Ϫ200 V substrate bias there is a reversal in the trend. The values of N ͑E F ͒ = 1.3ϫ 10 17 cm −3 eV −1 , E turn-on = 8.3 V / m, and J = 6.19 mA/ cm 2 were observed at Ϫ200 V substrate bias. However at Ϫ300 V the properties were not very different from those at Ϫ200 V substrate bias and so with a view to use the higher energy, hydrogen and nitrogen incorporation studies were carried out in this condition. It was observed that there was further enhancement in properties with hydrogen and nitrogen incorporation. The best properties measured with in the range of hydrogen and nitrogen incorporation in the present study were N ͑E F ͒ = 8.0ϫ 10 16 cm −3 eV −1 , E turn-on = 7.6 V / m, and J = 23.7 mA/ cm 2 , respectively.

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Section: Introductionmentioning

confidence: 99%

Effect of high substrate bias and hydrogen and nitrogen incorporation on density of states and field-emission threshold in tetrahedral amorphous carbon films

Panwar

Khan

Satyanarayana³

et al. 2010

Journal of Vacuum Science &Amp; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phen

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“…2). For high-tech applications, where macroparticle removal must be as perfect as possible, double bend or curvatures greater than 90° are utilized, for example in the S-filter [17], the off-plane double bend (OPDB) filter duct [18], the open Twist Filter [19] , the 120° filter [20], and the elongated S-filter for rectangular cathodes [21].…”

mentioning

confidence: 99%

Metal plasmas for the fabrication of nanostructures

Anders¹

2007

J. Phys. D: Appl. Phys.

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A review is provided covering metal plasma production, the energetic condensation of metal plasmas, and the formation of nanostructures using such plasmas. Plasma production techniques include pulsed laser ablation, filtered cathodic arcs, and various forms of ionized physical vapor deposition, namely magnetron sputtering with ionization of sputtered atoms in radio frequency discharges, self-sputtering, and high power impulse magnetron sputtering. The discussion of energetic condensation focuses on the control of kinetic energy by biasing and also includes considerations of the potential energy and the processes occurring at subplantation and implantation. In the final section on nanostructures, two different approaches are discussed. In the top-down approach, the primary nanostructures are lithographically produced and metal plasma is used to coat or fill trenches and vias. Additionally, multilayers with nanosize periods (nanolaminates) can be produced. In the bottom-up approach, thermodynamic forces are used to fabricate nanocomposites and nanoporous materials by decomposition and dealloying.

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“…Curved magnetic filters are commonly used with cathodic vacuum arcs to remove macroparticles from the plasma stream [9][10][11][12]. Since pioneering work of Aksenov and co-workers [9,13] it is known that biasing the filter positively improves plasma throughput and thus deposition rate.…”

Section: Introductionmentioning

confidence: 99%

Effect of Ion Mass and Charge State on Transport of Vacuum Arc Plasmas Through a Biased Magnetic Filter

Byon

Kim

Kwon

et al. 2004

IEEE Trans. Plasma Sci.

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The effect of ion mass and charge state on plasma transport through a 90°-curved magnetic filter is experimentally investigated using a pulsed cathodic arc source.Graphite, copper, and tungsten were selected as test materials. The filter was a bent copper coil biased via the voltage drop across a low-ohm, "self-bias" resistor. Ion transport is accomplished via a guiding electric field, whose potential forms a "trough"shaped by the magnetic guiding field of the filter coil. Evaluation was done by measuring the filtered ion current and determination of the particle system coefficient, which can be defined as the ratio of filter ion current, divided by the mean ion charge state, to the arc current. It was found that the ion current and particle system coefficient decreased as the mass-to-charge ratio of ions increased. This result can be qualitatively interpreted by a very simply model of ion transport that is based on compensation of the centrifugal force by the electric force associated with the guiding potential trough.2

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The Double Bend Filtered Cathodic Arc Technology and Its Applications

Cited by 78 publications

References 11 publications

Effect of high substrate bias and hydrogen and nitrogen incorporation on density of states and field-emission threshold in tetrahedral amorphous carbon films

Effect of high substrate bias and hydrogen and nitrogen incorporation on density of states and field-emission threshold in tetrahedral amorphous carbon films

Metal plasmas for the fabrication of nanostructures

Effect of Ion Mass and Charge State on Transport of Vacuum Arc Plasmas Through a Biased Magnetic Filter

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