2007
DOI: 10.1088/0022-3727/40/8/s06
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Metal plasmas for the fabrication of nanostructures

Abstract: A review is provided covering metal plasma production, the energetic condensation of metal plasmas, and the formation of nanostructures using such plasmas. Plasma production techniques include pulsed laser ablation, filtered cathodic arcs, and various forms of ionized physical vapor deposition, namely magnetron sputtering with ionization of sputtered atoms in radio frequency discharges, self-sputtering, and high power impulse magnetron sputtering. The discussion of energetic condensation focuses on the control… Show more

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Cited by 77 publications
(62 citation statements)
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“…The possibility to build up nano-plasma materials makes them attractive for applications such as antenna systems and elements of millimetre wave electronic devices [9]. Reference [10] presents the material devoted to various technologies for metal plasma production, especially on the formation of nanostructures using the metal-plasmas. These techniques allow one to obtain a trench-filling and a conformal coating of a substrate surface down to the 100 nm size; to fabricate super-hard and tough nano-structures by depositing the titanium-aluminium and titanium-zirconium films and even to reduce the friction coefficient between nano-structures by incorporating the ions of yttrium or vanadium.…”
Section: Introductionmentioning
confidence: 99%
“…The possibility to build up nano-plasma materials makes them attractive for applications such as antenna systems and elements of millimetre wave electronic devices [9]. Reference [10] presents the material devoted to various technologies for metal plasma production, especially on the formation of nanostructures using the metal-plasmas. These techniques allow one to obtain a trench-filling and a conformal coating of a substrate surface down to the 100 nm size; to fabricate super-hard and tough nano-structures by depositing the titanium-aluminium and titanium-zirconium films and even to reduce the friction coefficient between nano-structures by incorporating the ions of yttrium or vanadium.…”
Section: Introductionmentioning
confidence: 99%
“…25,27 In this study, the phase separation during the C:Ni film growth under energetic physical vapor deposition ͑PVD͒ conditions is studied. Although the two elements form a metastable Ni 3 C, 30,31 excess carbon is quickly expelled from the carbide phase. The influence of film composition, the energy and incidence angle of incoming species on the film morphology is investigated.…”
Section: Introductionmentioning
confidence: 99%
“…However, there are a few obstacles in obtaining size-uniform nanostructures with high throughput and at a low cost. Plasmabased growth methods [115,[118][119][120] have been shown to be promising controllable bottom-up alternatives for size-uniform and size-controlled growth. For example, it was demonstrated numerically [118,119] that plasmas lead to a greater degree of nanostructure size uniformity than is possible in a neutral gas-based selforganized process.…”
Section: Tailoring Metal Nanoarraysmentioning
confidence: 99%
“…Moreover a recent review on the use of metal vapour plasmas for the growth of metal nanostructures [115], noted that there were a number of options including ionised physical vapour deposition (iPVD) based on sputtering (more appropriate for Ag), as well as pulsed laser deposition, filtered cathodic arcs, etc. The benefit of using plasma-enhanced magnetron sputtering is that it is possible to exert a high level of control over both the direction and the energy of the charged particles.…”
Section: Tailoring Metal Nanoarraysmentioning
confidence: 99%
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