2012
DOI: 10.1063/1.4748576
|View full text |Cite
|
Sign up to set email alerts
|

The discharge condition to enhance electron density of capacitively coupled plasma with multi-holed electrode

Abstract: The multi-holed electrode that has been reported to enhance the electron density of the capacitively coupled plasma is now being adopted to speed up the processes. However, the discharge condition when the multi-holed electrode enhances the electron density of the discharge at fixed power is not studied. At low pressure, the multi-holed electrode increased the electron density of the plasma at fixed power. However, the multi-holed electrode is experimentally revealed to lower the electron density at high press… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
4
1

Citation Types

0
5
0

Year Published

2013
2013
2024
2024

Publication Types

Select...
9

Relationship

0
9

Authors

Journals

citations
Cited by 9 publications
(5 citation statements)
references
References 15 publications
0
5
0
Order By: Relevance
“…This mode is called the driftambipolar heating mode [32][33][34][35][36][37]. In the α-and γ-modes, electrodes with trench-like structures were found to enhance the electron heating, the ionization rate and the plasma density inside and above the structures [38][39][40][41][42][43][44][45][46][47][48]. This increase in the excitation and ionization is attributed to a hollow cathode effect and faster sheath expansion inside the structures as well as enhanced electric fields around the sharp edges of the structures [48].…”
Section: Influence Of a Phase-locked Rf Substrate Bias On The E-to H-...mentioning
confidence: 99%
“…This mode is called the driftambipolar heating mode [32][33][34][35][36][37]. In the α-and γ-modes, electrodes with trench-like structures were found to enhance the electron heating, the ionization rate and the plasma density inside and above the structures [38][39][40][41][42][43][44][45][46][47][48]. This increase in the excitation and ionization is attributed to a hollow cathode effect and faster sheath expansion inside the structures as well as enhanced electric fields around the sharp edges of the structures [48].…”
Section: Influence Of a Phase-locked Rf Substrate Bias On The E-to H-...mentioning
confidence: 99%
“…It has been found that RF-CCP with a hollow elec-trode can produce high-density plasma at a lower frequency (e.g., 13.56 MHz). [11,[18][19][20][21][22][23] Hollow electrode, which typically consists of hollow cylindrical electrode or rectangular electrode, is widely utilized in direct current (DC) discharge and RF discharge. [24,25] Compared with the conventional parallelplate structure, the cavity structure reduces the loss of charged particles.…”
Section: Introductionmentioning
confidence: 99%
“…In addition to parallel-plate electrodes [17][18][19], hollow electrodes [20][21][22][23][24][25] are also frequently applied in RF and direct current (DC) discharges. With a hollow electrode, RF-CCPs can produce higher plasma density outside the cavity when a low frequency is utilized, which implies that plasma density enhancement effect exists in RF discharges with hollow electrodes [20][21][22][26][27][28]. Moreover, utilizing hollow electrodes with different shapes, uniform plasma density can be obtained and the film deposition quality can be improved [29][30][31].…”
Section: Introductionmentioning
confidence: 99%