A novel transparent conductive support structure for scalable integration of 2D materials is demonstrated, providing an electronically passive 2D-3D interface while also enabling facile interfacial charge transport. This structure, which comprises an evaporated nanocrystalline carbon (nc-C) film beneath nanometer-thin atomic layer deposited AlO x , is thermally stable and allows direct chemical vapor deposition of 2D materials onto the surface. The combination of spatial uniformity, enhanced charge screening, and low interface defect concentrations yields a tenfold enhancement of MoS 2 photoluminescence intensity compared to flakes on conventional Si/SiO 2 , while also retaining the strong optical contrast for monolayer flakes. Tunneling across the ultrathin AlO x enables facile interfacial charge injection, which is utilized for high-resolution scanning electron microscopy and photoemission electron microscopy with no detectable charging. Thus, this combination of scalable fabrication and electronic conductivity across a weakly interacting 2D-3D interface opens up new opportunities for device integration and characterization of 2D materials.