2007
DOI: 10.1109/tcapt.2007.901749
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The Corrosion of Electronic Resistors

Abstract: Precision thick chip resistors are used in a variety of different industries, from telecommunications to automotive electronics, and as such can be exposed to mild and aggressive corrosive environments. This paper investigates the corrosion performance of two generic precision thick chip resistors in a controlled corrosive atmosphere consisting of 60 C, 4 ppm H 2 S and water vapor in purified air. The resistors were exposed in an environmental chamber for periods of 5, 10, 15, 30, and 60 days. Following exposu… Show more

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Cited by 26 publications
(17 citation statements)
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References 16 publications
(11 reference statements)
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“…The main failure point was observed at the interface between the surface finish and the overcoat, which is consistent with the literature and field data [12][13][14][15][16]. The locus of failure would indicate that the Ni/Sn layer overlap of the glass layer did not perform as a barrier/hermitic seal for the protection of the Ag layer.…”
Section: Resultssupporting
confidence: 85%
See 2 more Smart Citations
“…The main failure point was observed at the interface between the surface finish and the overcoat, which is consistent with the literature and field data [12][13][14][15][16]. The locus of failure would indicate that the Ni/Sn layer overlap of the glass layer did not perform as a barrier/hermitic seal for the protection of the Ag layer.…”
Section: Resultssupporting
confidence: 85%
“…The locus of failure would indicate that the Ni/Sn layer overlap of the glass layer did not perform as a barrier/hermitic seal for the protection of the Ag layer. The overlap is clearly crucial to the overall corrosion reliability of the resistor [12][13][14][15][16]. The resistor types that exhibited failures demonstrated the poorest overlap as shown in Table II.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…This indicates that AgO and Ag 2 O are reduced at the same potential in Na 2 SO 4 . Therefore, in Figure 2 for the sample with preformed Ag 2 S that was then exposed to ozone, RH and UV, the plateau at −0.08 V MSE must be due to reduction of Ag 2 SO 4 . This indicates that the unknown plateau at this potential for Ag exposed at West Jefferson corresponds to the reduction of Ag 2 SO 4 .…”
Section: Resultsmentioning
confidence: 97%
“…However, it is possible that strong oxidizing species, such as O 3 , can oxidize SO 2 to SO 4 2− 12 which then reacts with Ag ions to form Ag 2 SO 4 . Another possible Ag 2 SO 4 formation pathway involves airborne sulfate aerosols.…”
Section: Resultsmentioning
confidence: 99%