Colloidal suspensions enjoy widespread use in applications ranging from advanced materials to drug delivery. By tailoring the interactions between particles, one can design colloidal fluids, gels, or crystals needed for ceramic, 1 coating, 2 ink, 3 photonic, 4,5 and pharmaceutical materials. 6 One common strategy is to alter their electrostatic interactions by varying either the pH or ionic strength of the solution in which they are suspended. 7 However, problems such as nonuniform mixing and disruption of suspension microstructure arise when acid, base, or electrolyte species are added. The ability to tailor electrostatic interactions between colloids with spatial and temporal control in the absence of chemical additions would not only alleviate these problems but also open new possibilities in colloidal assembly. Here we demonstrate an approach to modulate the surface charge of colloidal particles and, hence, their electrostatic interactions by irradiation with UV light.To generate light-sensitive colloidal particles, we designed a new self-assembled monolayer (SAM) that undergoes charge inversion upon photocleavage (Figure 1). Each molecule of the SAM is initially terminated with a positively charged ammonium (-NH 3 + ) group. Photocleavage of the ortho-nitrobenzyl linker 8 then exposes an underlying negatively charged carboxylate (-COO -) group. Accordingly, silica particles functionalized with this SAM are expected to possess an effective charge (or zeta potential) that can be tuned through a broad range of positive, neutral, and negative values at fixed pH simply by exposure to UV light for varying times. Because their zeta potential ( ) can be regulated by irradiation alone, it should be possible to induce phase changes within colloidal suspensions without externally altering their solution composition.As described in detail in the Supporting Information, chlorosilane 1 is synthesized in three steps from the known 4-(hydroxymethyl)-3-nitrobenzoic acid. 9 Immobilization of 1 on dried silica microspheres (∼1 µm diameter) is accomplished in toluene with triethylamine as an acid scavenger ( Figure 1). Brief exposure to trifluoroacetic acid (TFA) in methylene chloride converts the BOC group to an ammonium cation. This stable colloidal suspension undergoes rapid flocculation upon exposure to TFA. After washing with methylene chloride, the ammonium-terminated microspheres (silica-SAM-NH 3 + ) are washed with benzene and lyophilized.To confirm the expected photochemical transformation, the particles' surface composition was examined via X-ray photoelectron spectroscopy (XPS) before and after irradiation. As shown in Figure 2, the nitrogen 1s photoelectron peak decreases substantially upon exposure of colloidal suspensions to UV light. This observation is consistent with photoinduced cleavage of the bifunctional SAM, which results in a loss of amino and nitro groups from the microsphere surface. From the XPS integrated intensities, it is estimated that 85-95% of the nitrogen has been removed from the silica-SAM af...