The combinatorial atmospheric pressure chemical vapour deposition (cAPCVD) of a gradating N-doped mixed phase titania thin film

Kafizas, Andreas; Parkin, Ivan P.

doi:10.1039/b914117k

Cited by 48 publications

(79 citation statements)

References 50 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…There has been much interest in the synthesis of the best performing gallium doped indium oxide, not least for its improved transmission in the blue green. This technique has been applied to LPCVD in the investigation of multi metallic oxide materials; 182-184 APCVD for the synthesis of titanium oxide, 167 titanium oxynitride, 185 doping of photocatalytic films, 186 varying conductivity of vanadium oxide and oxynitride films, 187 doped titania films 188,189 and varying niobium doping in anatase. 25).…”

Section: Ternary Main Group Tcosmentioning

confidence: 99%

Solution based CVD of main group materials

2016

View full text Add to dashboard Cite

This critical review focuses on the solution based chemical vapour deposition (CVD) of main group materials with particular emphasis on their current and potential applications. Deposition of thin films of main group materials, such as metal oxides, sulfides and arsenides, have been researched owing to the array of applications which utilise them including solar cells, transparent conducting oxides (TCOs) and window coatings. Solution based CVD processes, such as aerosol-assisted (AA)CVD have been developed due to their scalability and to overcome the requirement of suitably volatile precursors as the technique relies on the solubility rather than volatility of precursors which vastly extends the range of potentially applicable compounds. An introduction into the applications and precursor requirements of main group materials will be presented first followed by a detailed discussion of their deposition reviewed according to this application. The challenges and prospects for further enabling research in terms of emerging main group materials will be discussed.

show abstract

Section: Ternary Main Group Tcosmentioning

confidence: 99%

Solution based CVD of main group materials

2016

View full text Add to dashboard Cite

show abstract

“…The results of this work are relevant to the increasing number of researchers that are using paiis to assess the activity of their photocatalytic films [30][31][32][33][34][35].…”

Section: Effect Of Rz Ink Film Thickness B On the Kinetics Of Reducmentioning

confidence: 99%

Kinetics of reduction of a resazurin-based photocatalytic activity ink

Mackenzie¹,

MacDonald²,

Mills

et al. 2017

Catalysis Today

View full text Add to dashboard Cite

“…It is often argued that doping TiO 2 typically encourages recombination, where the dopant sites act as centres for recombination. 47 Interestingly, the rate of recombination varied substantially in our P-doped TiO 2 materials. No complete correlation between recombination rate and P-doping levels could be established; however our findings do suggest that a faster recombination rate occurs when the P 5+ and P 3-concentration are equivalent.…”

Section: Optical Propertiesmentioning

confidence: 99%

Multifunctional P-Doped TiO₂ Films: A New Approach to Self-Cleaning, Transparent Conducting Oxide Materials

et al. 2015

Self Cite

View full text Add to dashboard Cite

Multifunctional P-doped TiO 2 thin-films were synthesised by atmospheric pressure chemical vapour deposition (APCVD). This is the first example of P-doped TiO 2 films with both P 5+ and P 3-states, with the relative proportion being determined by synthesis conditions. This technique to control the oxidation state of the impurities presents a new approach to achieve films with both self-cleaning and TCO properties. The origin of electrical conductivity in these materials was correlated to the incorporation of P 5+ species, as suggested by Hall Effect probe measurements. The photocatalytic performance of the films was investigated using the model organic pollutant, stearic acid, with films containing predominately P 3-states found to be vastly inferior photocatalysts compared to undoped TiO 2 films. Transient absorption spectroscopy studies also showed that charge carrier concentrations increased by several orders of magnitude in films containing P 5+ species only, whereas photo-generated carrier lifetimesand thus photocatalytic activity, were severely reduced upon incorporation of P 3-species. The results presented here provide important insights on the influence of dopant nature and location within a semiconductor structure. These new P-doped TiO 2 films are a breakthrough in the development of multifunctional advanced materials with tuned properties for a wide range of applications.

show abstract

The combinatorial atmospheric pressure chemical vapour deposition (cAPCVD) of a gradating N-doped mixed phase titania thin film

Cited by 48 publications

References 50 publications

Solution based CVD of main group materials

Solution based CVD of main group materials

Kinetics of reduction of a resazurin-based photocatalytic activity ink

Multifunctional P-Doped TiO₂ Films: A New Approach to Self-Cleaning, Transparent Conducting Oxide Materials

Contact Info

Product

Resources

About

The combinatorial atmospheric pressure chemical vapour deposition (cAPCVD) of a gradating N-doped mixed phase titania thin film

Cited by 48 publications

References 50 publications

Solution based CVD of main group materials

Solution based CVD of main group materials

Kinetics of reduction of a resazurin-based photocatalytic activity ink

Multifunctional P-Doped TiO2 Films: A New Approach to Self-Cleaning, Transparent Conducting Oxide Materials

Contact Info

Product

Resources

About

Multifunctional P-Doped TiO₂ Films: A New Approach to Self-Cleaning, Transparent Conducting Oxide Materials