Solution based CVD of main group materials

Abstract

This critical review focuses on the solution based chemical vapour deposition (CVD) of main group materials with particular emphasis on their current and potential applications. Deposition of thin films of main group materials, such as metal oxides, sulfides and arsenides, have been researched owing to the array of applications which utilise them including solar cells, transparent conducting oxides (TCOs) and window coatings. Solution based CVD processes, such as aerosol-assisted (AA)CVD have been developed due to their scalability and to overcome the requirement of suitably volatile precursors as the technique relies on the solubility rather than volatility of precursors which vastly extends the range of potentially applicable compounds. An introduction into the applications and precursor requirements of main group materials will be presented first followed by a detailed discussion of their deposition reviewed according to this application. The challenges and prospects for further enabling research in terms of emerging main group materials will be discussed.

Transparent superhydrophobic PTFE films via one-step aerosol assisted chemical vapor deposition

“…Aerosol-assisted chemical vapor deposition (AACVD) is a simple and easily scalable technique that operates at ambient pressure. 32,33 Precursors for AACVD are dissolved in a suitable solvent and delivered to the CVD chamber in the form of aerosol droplets. As such, the precursors need not be volatile, only soluble in a suitable solvent.…”

Thin film deposition at atmospheric pressure using dielectric barrier discharges: Advances on three-dimensional porous substrates and functional coatings

“…65,66) However, due to the high operating temperatures, most published studies on AACVD refer to the production of inorganic NC coatings in which for instance the inorganic NPs are embedded in a host metal oxide matrix. 65,66) Interestingly, recently it was shown that the adequate choice of the organic component (e.g., a thermosetting silicone elastomer) 67) and of the temperature allows avoiding the pyrolytic decomposition of the organic fraction and affords the deposition of an organic-inorganic NC coatings. In this context, the aerosol-assisted atmospheric cold plasma deposition from dispersions containing inorganic NPs and the liquid organic precursor represents a promising approach, since the deposition occurs in a single step and at room temperature.…”

Accessing new 2D semiconductors with optical band gap: synthesis of iron-intercalated titanium diselenide thin films via LPCVD

“…Recent research has highlighted the importance of careful precursor design, in order to facilitate cleaner decomposition, 22 lowering contamination and improving performance of the resultant functional material. Chemical vapour deposition (CVD) has drawn attention as a method to synthesis thin lms of functional materials, 23 including metal selenides. 24,25 The use of single source precursors in CVD has a number of advantages, not least the simplication of the decomposition mechanism since all required elements are delivered to the desired substrate at the same time.…”

“…[1][2][3][4][5] The design of high-efficiency materials which can convert solar to electrical energy is a continuously increasing research topic, in which the main path nowadays involves thin-lm technology. 6 Early transition metal chalcogenides have been reported to have applications as cathode materials for rechargeable batteries.…”