2020
DOI: 10.3390/pr8121575
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The Combination of Simultaneous Plasma Treatment with Mg Nanoparticles Deposition Technique for Better Mung Bean Seeds Germination

Abstract: A novel method based on the combination of simultaneous cold plasma treatment with Mg nanoparticles deposition, applied to Mung bean seeds by improving their quality, is presented. The SRIM simulation reveals that only the very top layer of the seeds surface can be altered by the plasma. The experimental analysis indicates surface composition changes with a polar groups formation. These groups initiate the shift of surface characteristics from hydrophobic to hydrophilic. The chemical bond analysis shows the fo… Show more

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Cited by 15 publications
(13 citation statements)
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“…As for legumes, we have recently demonstrated surface oxidation of bean seeds using the same plasma system as that used here [23]. Comparable effects were also seen on mung bean surfaces after plasma treatment [51].…”
Section: X-ray Photoelectron Spectroscopymentioning
confidence: 62%
“…As for legumes, we have recently demonstrated surface oxidation of bean seeds using the same plasma system as that used here [23]. Comparable effects were also seen on mung bean surfaces after plasma treatment [51].…”
Section: X-ray Photoelectron Spectroscopymentioning
confidence: 62%
“…The eustress response to CP and EMF treatment is related to the increased ratio between gibberellins and abscisic acid contents [ 29 , 32 ]. Another well documented mechanism is CP-induced seed surface modification (mainly oxidation due to active particles present in plasma) and consequent increase in hydrophilicity and improved water uptake [ 33 , 34 ]. EMF does not induce such changes on seed surface, because seeds do not interact with aggressive CP-generated particles upon exposure to EMF [ 35 ].…”
Section: Discussionmentioning
confidence: 99%
“…These are expected elements to appear on biological sample surfaces, originating either from cellular material or environmental contamination. If we consider that after the oxidizing plasma treatment, the inorganic materials are most likely found in the form of oxides (SiO 2 , MgO, Mg(OH) 2 , CaO) [51]; the amount of oxygen taken up in this way adds up to about 5-12 at.% per treatment condition, which leaves the remaining oxygen, bonded to carbon, at about 20-30 at.%. A paper by Gómez-Ramírez et al suggests that this accumulation of mineral elements at the seed surface after plasma treatment may be due to their inner diffusion and migration to the seed surface layers [50].…”
Section: X-ray Photoelectron Spectroscopymentioning
confidence: 99%