The paper summarizes current knowledge of growth defects in physical vapor deposition (PVD) coatings. A detailed historical overview is followed by a description of the types and evolution of growth defects. Growth defects are microscopic imperfections in the coating microstructure. They are most commonly formed by overgrowing of the topographical imperfections (pits, asperities) on the substrate surface or the foreign particles of different origins (dust, debris, flakes). Such foreign particles are not only those that remain on the substrate surface after wet cleaning procedure, but also the ones that are generated during ion etching and deposition processes. Although the origin of seed particles from external pretreatment of substrate is similar to all PVD coatings, the influence of ion etching and deposition techniques is rather different. Therefore, special emphasis is given on the description of the processes that take place during ion etching of substrates and the deposition of coating. The effect of growth defects on the functional properties of PVD coatings is described in the last section. How defects affect the quality of optical coatings, thin layers for semiconductor devices, as well as wear, corrosion, and oxidation resistant coatings is explained. The effect of growth defects on the permeation and wettability of the coatings is also shortly described.
In this work, the causes of porosity of TiAlN hard coatings sputter deposited on D2 tool steel were studied since its corrosion resistance is mainly affected by imperfections within the coating (e.g., pinholes, pores, crevices). The corrosion test was performed in a chlorine solution using electrochemical impedance spectroscopy. The coating morphology of growth defects before and after the exposure was studied by scanning electron microscopy (SEM), while focused ion beam (FIB) was used to make series of cross-sections through individual selected defects. We confirm that pitting corrosion is closely related to the through-thickness growth defects. It was also found that in the case of nodular defects, the intensity of corrosion depends on the shape of the seed.
Seeds of common bean (Phaseolus vulgaris L.), of the Etna variety, were treated with low-pressure oxygen plasma sustained by an inductively coupled radiofrequency discharge in the H-mode for a few seconds. The high-intensity treatment improved seed health in regard to fungal contamination. Additionally, it increased the wettability of the bean seeds by altering surface chemistry, as established by X-ray photoelectron spectroscopy, and increasing surface roughness, as seen with a scanning electron microscope. The water contact angle at the seed surface dropped to immeasurably low values after a second of plasma treatment. Hydrophobic recovery within a month returned those values to no more than half of the original water contact angle, even for beans treated for the shortest time (0.5 s). Increased wettability resulted in accelerated water uptake. The treatment increased the bean radicle length, which is useful for seedling establishment in the field. These findings confirm that even a brief plasma treatment is a useful technique for the disinfection and stimulation of radicle growth. The technique is scalable to large systems due to the short treatment times.
The cultivation of alfalfa (Medicago sativa L.), a forage crop grown worldwide, is negatively affected by hard seed presence. We show that treatment of alfalfa seeds with an inductively coupled radio frequency oxygen plasma improves their surface hydrophilicity, as determined by water contact angle (WCA) measurements and water uptake. Furthermore, we see that these effects are mediated by functionalization and etching of the alfalfa seed surface. Surface chemistry is analyzed by X-ray photoelectron spectroscopy (XPS), while morphology is viewed using scanning electron microscopy (SEM). Plasma produces effective alfalfa seed hydrophilization with a variety of treatment parameters. With its potential for fine-tuning, plasma modification of seed wettability shows promise for introduction into agricultural practice.
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