2010
DOI: 10.1007/s10854-010-0228-2
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The change in the electrical transport mechanism from the grain boundary conduction to the nearest-neighbor hopping conduction in SnO2

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Cited by 9 publications
(3 citation statements)
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“…The results indicate that the deposited n-SnO 2 layers exhibit four diffraction peaks located at 26.8, 34.15, 38.1, and 52.1, showing that the layers are polycrystalline in nature. [14] The increase in intensity of peaks reveals the improvement in the crystalline quality of the investigated layers.…”
Section: Resultsmentioning
confidence: 90%
“…The results indicate that the deposited n-SnO 2 layers exhibit four diffraction peaks located at 26.8, 34.15, 38.1, and 52.1, showing that the layers are polycrystalline in nature. [14] The increase in intensity of peaks reveals the improvement in the crystalline quality of the investigated layers.…”
Section: Resultsmentioning
confidence: 90%
“…The Nearest-Neighbor Hopping conduction (NNH) becomes the main conduction mechanism. The resistivity of NNH is given by [6,7]…”
Section: Resultsmentioning
confidence: 99%
“…The aforementioned MO x /Si HPDs offer a reasonable solution for the detection of UV-B radiation. Among MO x semiconductors, SnO 2 thin films can assure an attractive approach for UV-B detection thanks to the following characteristics, including (a) wide band gap of 3.5-4 eV (the absorption edge at around 310-354 nm, incorporating the UV-A and UV-B regimes), (b) high chemical and radiation stability, (c) low growth temperature [18][19][20][21][22][23]. In a n-SnO 2 /p-Si HPD, UV spectrum (λ < λ g , where λ g , is wavelength corresponding to band gap energy) is directly absorbed by SnO 2 emitter layer, while the remaining spectrum can pass through the SnO 2 layer and reach the Si layer.…”
Section: Introductionmentioning
confidence: 99%