The black silicon method. VIII. A study of the performance of etching silicon using SF6/O2-based chemistry with cryogenical wafer cooling and a high density ICP source

Jansen, Henricus V.; Boer, Meint J. de; Wensink, H.; Kloeck, B.; Elwenspoek, Michael Curt

doi:10.1016/s0026-2692(01)00039-8

Cited by 83 publications

(50 citation statements)

References 5 publications

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“…In the discussion of the evolution of the Black Silicon structures, we will rely on the extensive studies of SF 6 -O 2 etching process by Dussart and co-workers 15,[24][25][26] as well as the pioneering work of Jansen, de Boer and co-workers who first described the Black Silicon process. 14,27 Generally two reactions occur in the presence of the SF 6 -O 2 plasma. First, fluorine radicals F* etch the silicon surface chemically under the formation of volatile SiF 4…”

Section: A Structure Evolution During Etchingmentioning

confidence: 99%

“…Increasing the oxygen flow over a certain threshold leads to a stronger passivation that also inhibits the etching on horizontal faces and causes a sharp drop of the etch rate. 25,27 This so-called overpassivating regime leads to the formation of Black Silicon structures. 15 Apparently, in the initial stage of structure formation, the substrate roughness is strongly increased (compare images after 0 min and 0.5 min in Figure 1).…”

Section: A Structure Evolution During Etchingmentioning

confidence: 99%

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The structural and optical properties of black silicon by inductively coupled plasma reactive ion etching

Steglich

Käsebier

Zilk

et al. 2014

Journal of Applied Physics

109

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Black Silicon nanostructures are fabricated by Inductively Coupled Plasma Reactive Ion Etching (ICP-RIE) in a gas mixture of SF6 and O2 at non-cryogenic temperatures. The structure evolution and the dependency of final structure geometry on the main processing parameters gas composition and working pressure are investigated and explained comprehensively. The optical properties of the produced Black Silicon structures, a distinct antireflection and light trapping effect, are resolved by optical spectroscopy and conclusively illustrated by optical simulations of accurate models of the real nanostructures. By that the structure sidewall roughness is found to be critical for an elevated reflectance of Black Silicon resulting from non-optimized etching processes. By analysis of a multitude of structures fabricated under different conditions, approximate limits for the range of feasible nanostructure geometries are derived. Finally, the technological applicability of Black Silicon fabrication by ICP-RIE is discussed

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Section: A Structure Evolution During Etchingmentioning

confidence: 99%

Section: A Structure Evolution During Etchingmentioning

confidence: 99%

The structural and optical properties of black silicon by inductively coupled plasma reactive ion etching

Steglich

Käsebier

Zilk

et al. 2014

Journal of Applied Physics

109

View full text Add to dashboard Cite

show abstract

“…In the etching process, the ratio of O 2 and SF 6 is critical since they are used to produce a SiO x F y passivation layer on silicon substrate. [47][48][49][50] When the flow rate of O 2 increases, the anisotropic etching prevails because of greater protection from thick SiO x F y passivation layer and the microstructures with vertical sidewall are obtained. On the other hand, the isotropic etching effect dominates when O 2 flow rate decreases.…”

Section: A Sem Images Of a Silicon Microneedles Arraymentioning

confidence: 99%

Electrokinetic trapping and surface enhanced Raman scattering detection of biomolecules using optofluidic device integrated with a microneedles array

Deng

Juang

2013

Biomicrofluidics

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In this study, microneedles which possess sharp tips were utilized to trap and detect the biomolecules. Owing to the large curvature, the tips of the microneedles created a substantially high gradient of electric field under the non-uniform electric field which served as not only the trapping sites but also the substrate for surface enhanced Raman scattering (SERS). Separation of polystyrene microparticles with different sizes and two kinds of biomolecules (Staphylococcus aureus (S. aureus) and the red blood cells (RBCs)) were demonstrated. Moreover, in situ detection of S. aureus was performed immediately after separation was completed. The results showed that, after 15 s of sample collection, the Raman signals of S. aureus were detected and greatly enhanced through SERS effect. V C 2013 American Institute of Physics. [http://dx

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“…Subsequently, the silicon underneath the membrane layer ͑2͒ is anisotropically etched 14,15 with an SF 6 /O 2 plasma at 100 mTorr and 100 W for 10 min with an etch rate of 2 m / min to form the macroscopic openings in the support ͑1͒. Figure 5 shows a SEM photograph of the resulting perforated membrane layer ͑2͒ showing a very regular pore pattern, the pore size being 260 nm with a pore-to-pore spacing of 510 nm.…”

Section: Device Fabrication With Short Exposure Timementioning

confidence: 99%

Laser interference as a lithographic nanopatterning tool

Rijn¹

2006

J. Micro/Nanolith. MEMS MOEMS

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Abstract. Laser interference lithography is reviewed as an adequate nanopatterning tool for devices with periodic structures. The structure size may practically be chosen in the range between 100 nm and 10.0 m by adjusting the angle of incidence of the incoming laser beam. The exposure method is fast, inexpensive, and applicable for large areas. The method may be used to fabricate microsieves, shadow masks, calibration grids, and photonic crystals.

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The black silicon method. VIII. A study of the performance of etching silicon using SF6/O2-based chemistry with cryogenical wafer cooling and a high density ICP source

Cited by 83 publications

References 5 publications

The structural and optical properties of black silicon by inductively coupled plasma reactive ion etching

The structural and optical properties of black silicon by inductively coupled plasma reactive ion etching

Electrokinetic trapping and surface enhanced Raman scattering detection of biomolecules using optofluidic device integrated with a microneedles array

Laser interference as a lithographic nanopatterning tool

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