TiO 2 thin films with various morphologies were grown on Ti substrates by the LP-MOCVD technique (Low Pressure Chemical Vapour Deposition from Metal-Organic precursor), with titanium tetra-iso-propoxide as a precursor. All the films were prepared in the same conditions except the deposition time. They were characterized by X-ray diffraction, scanning electron microscopy, optical interferometry, water contact angle measurements. MOCVD-fabricated TiO 2 thin films are known to be adapted to cell culture for implant requirements. Human gingival fibroblasts were cultured on the various TiO 2 deposits. Differences in cell viability (MTT tests) and cell spreading (qualitative assessment) were observed and related to film roughness, wettability and allotropic composition.