2003
DOI: 10.1016/s0924-4247(03)00180-8
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The application of chemical–mechanical polishing for planarizing a SU-8/permalloy combination used in MEMS devices

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Cited by 33 publications
(18 citation statements)
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“…Planarization is necessary in multi-layer processes [38], and micromachining was adopted to improve the surface quality, and give control over the layer thickness. As hybrid systems are typically used for porous structures with metal/ceramic nanoparticles, mechanical planarization processes are suitable for inorganic materials.…”
Section: Process Configuration Overviewmentioning
confidence: 99%
“…Planarization is necessary in multi-layer processes [38], and micromachining was adopted to improve the surface quality, and give control over the layer thickness. As hybrid systems are typically used for porous structures with metal/ceramic nanoparticles, mechanical planarization processes are suitable for inorganic materials.…”
Section: Process Configuration Overviewmentioning
confidence: 99%
“…If possible, resist molds were only filled to about 60-70% of their height to avoid current concentration effects at the resist surface. Otherwise, for instance, when a complete filling of permanent SU-8 structures is required, mechanical planarization of the resist/metal surface was applied using CMP, resulting in precise features (Kourouklis et al, 2002).…”
Section: Electroplatingmentioning
confidence: 99%
“…An exception represents the description of a first CMP process which was already developed for and applied on MEMS based on multi-layer structures featuring soft magnetic cores (NiFe alloys) and excitation coils [11,21]. But an optimized and more efficient CMP process for these materials, which can be a crucial drive for improving functionality, decreasing dimensions, and extending the application field of magnetic MEMS has not been developed yet.…”
Section: Introductionmentioning
confidence: 99%