1987
DOI: 10.1016/0039-6028(87)90037-9
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The adsorption and decomposition of N2O on nickel (100)

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Cited by 36 publications
(13 citation statements)
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“…5,7 Such analysis was once reported from our group for a steady-state NO (or N 2 O) þ CO reaction on Pd(110) at limited conditions. 11,15,16 This N 2 O species is very reactive on open surfaces such as Cu(110), 17 Ni(110), 18 Ni(100), 19 stepped Ni(557), 20 Rh(110), Ir(110), and Pd(110). [8][9][10][21][22] The decomposition proceeds at around 100 K or even below it.…”
Section: Introductionmentioning
confidence: 99%
“…5,7 Such analysis was once reported from our group for a steady-state NO (or N 2 O) þ CO reaction on Pd(110) at limited conditions. 11,15,16 This N 2 O species is very reactive on open surfaces such as Cu(110), 17 Ni(110), 18 Ni(100), 19 stepped Ni(557), 20 Rh(110), Ir(110), and Pd(110). [8][9][10][21][22] The decomposition proceeds at around 100 K or even below it.…”
Section: Introductionmentioning
confidence: 99%
“…N 2 O has been reported to react in a similar way with Ni(1 0 0) [7], Al(1 0 0) [8], Ag(1 1 1) [9], and Ru(0 0 1) [10]. This in contrast to other metals where dissociative adsorption is observed and both oxygen and nitrogen remain on the surface [11,12], and in some cases molecular adsorption has been reported [13,14].…”
Section: Adsorption Of Nitrous Oxidementioning
confidence: 79%
“…In this work, attention is paid to the result of the contact induced temperature gradient rather than getting information from a small part of the nano film in its midst, for example, by using a Feulner cup 23 or other techniques as stagnation chambers. 24 In order to quantitatively model the situation of electrical contact induced temperature gradients, we divide the film into finite volume elements dV = (h Pt + h Si )wdx ≈ h Si w dx, where h Pt is the thickness of the Pt film, h Si the one of the SiO 2 /Si/SiO 2 substrate, w the width, and dx the length of the differential volume element (see Fig. 4.)…”
Section: Resultsmentioning
confidence: 99%