TFT-LCD technology

Kobayashi, Masayuki

doi:10.1016/s0040-6090(98)01519-3

Cited by 140 publications

(56 citation statements)

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“…Cost drivers are the inevitable vacuum process which hinders continuous production and the requirement of substractively wet chemical patterning steps. [4] Wet deposition techniques are of emerging interest due to their high cost reduction potential based on missing vacuum demand, printing possibility comprising large area fabrication potential, and the feasibility of direct patterning. Beside the several deposition methods, there exist two different principles of wet chemical processing: The sol-gel-technique, characterized by deposition of precursors with subsequent transformation into ITO [25][26][27][28][29][30] and the deposition of a dispersion containing ITO nanoparticles.…”

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confidence: 99%

Conductance Enhancement Mechanisms of Printable Nanoparticulate Indium Tin Oxide (ITO) Layers for Application in Organic Electronic Devices

et al. 2009

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Indium tin oxide (ITO, In 2 O 3 :SnO 2 ) thin films exhibit a high conductance along with brilliant transparency in the optical range. [1][2][3] In spite of the existence of some other transparent conducting oxide materials and the high material costs, ITO is widely used as transparent electrode material in stateof-the-art optoelectronic devices such as TFT-LCD-s, [4][5] plasma TV-s, and touchscreens. It is also utilized in novel, smart optoelectronic applications including organic solar cells, [6][7] electrochromic devices, [8] and organic light emitting diodes (OLEDs) for displays [9][10][11] or for lighting. [12] Usually ITO thin films are fabricated by physical vapor deposition (PVD) methods including RF-sputtering [13,14] and magnetron sputtering [2,[15][16][17] as well as pulsed laser deposition [18,19] and several other evaporation techniques. [20][21][22][23][24] PVD derived ITO layers are characterized by high conductances of partly more than 10 000 V À1 cm À1 , [19,22] but also by high production costs. Cost drivers are the inevitable vacuum process which hinders continuous production and the requirement of substractively wet chemical patterning steps. [4] Wet deposition techniques are of emerging interest due to their high cost reduction potential based on missing vacuum demand, printing possibility comprising large area fabrication potential, and the feasibility of direct patterning. Beside the several deposition methods, there exist two different principles of wet chemical processing: The sol-gel-technique, characterized by deposition of precursors with subsequent transformation into ITO [25][26][27][28][29][30] and the deposition of a dispersion containing ITO nanoparticles. [30][31][32][33][34] Sol-gel ITO films can possess adequate conductances of >350 V À1 cm À1 , [25,26,35] which can be increased to >1600 V À1 cm À1 by temperature treatment in nitrogen or forming gas. [26,30] Due to the required low precursor to solvent ratio, only thicknesses of about 10-20 nm can be achieved for the sol-gel single layers, [26,30] which leads to high sheet resistances. To avoid this, costly repetitions of the deposition and transformation sequence are necessary.In contrast to sol-gel ITO layers, nanoparticle dispersion derived thin films enable the production of almost every thickness. They can also be produced on flexible polymer substrates, [34] but exhibit comparatively low conductances. The latter is related to a poor electrical contact between the primary particle aggregates and high inter-grain porosity. [30,32,33] Typical conductance after layer deposition is in the order of 10 À2 V À1 cm À1 and rises to several 10 0 V À1 cm À1 after annealing in air at 550 8C. [33,36] In order to overcome this conductance bottleneck, we investigated the impact of various conductance improving techniques on the electrical, optical, and morphological properties of nanoparticulate printed ITO layers. ExperimentalNanoparticulate ITO layers for electrical measurements were made by spin-coating a commercial ethanolic dispersi...

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confidence: 99%

Conductance Enhancement Mechanisms of Printable Nanoparticulate Indium Tin Oxide (ITO) Layers for Application in Organic Electronic Devices

et al. 2009

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“…Until now, ITO is the TCO material having with the lowest resistivity (i.e. order of 1-2 × 10 −4 Ω·cm), which is widely utilized as the transparent electrodes in flatpanel displays [28,29]. Table 1 summarizes the most promising mechanisms of modulation and its corresponding materials.…”

Section: Transparent Conductive Oxides Used In Photonicsmentioning

confidence: 99%

Indium-Tin-Oxide for High-performance Electro-optic Modulation

et al. 2015

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Advances in opto-electronics are often led by discovery and development of materials featuring unique properties. Recently, the material class of transparent conductive oxides (TCO) has attracted attention for active photonic devices on-chip. In particular, indium tin oxide (ITO) is found to have refractive index changes on the order of unity. This property makes it possible to achieve electrooptic modulation of sub-wavelength device scales, when thin ITO films are interfaced with optical light confinement techniques such as found in plasmonics; optical modes are compressed to nanometer scale to create strong light-matter interactions. Here we review efforts towards utilizing this novel material for high performance and ultra-compact modulation. While high performance metrics are achieved experimentally, there are open questions pertaining to the permittivity modulation mechanism of ITO. Finally, we review a variety of optical and electrical properties of ITO for different processing conditions, and show that ITO-based plasmonic electro-optic modulators have the potential to significantly outperform diffractionlimited devices.

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“…Indium tin oxide (ITO) and zinc oxide (ZnO) are typical oxide materials used for such purposes [2]. ITO is widely used in flat panel displays and solar cells, but it is also found in heat mirrors and smart-window applications due to its excellent infrared reflection properties [3][4][5]. However, there are several drawbacks to using ITO.…”

Section: Introductionmentioning

confidence: 99%

Metal-nanowall grating transparent electrodes: Achieving high optical transmittance at high incident angles with minimal diffraction

Kuang¹,

Park²,

Liu³

et al. 2013

Opt. Express

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A novel architecture has been employed to fabricate transparent electrodes with high conductivity and high optical transmittance at high incident angles. Soft lithography is used to fabricate polymer grating patterns onto which thin metallic films are deposited. Etching removes excess metal leaving tall walls of metal. Polymer encapsulation of the structure both protects the metal and minimizes diffraction. Transmission is dependent upon the height of the walls and encapsulation and varies from 60% to 80% for structures with heights of 1400 nm to 300 nm. In encapsulated structures, very little distortion is visible (either parallel to or perpendicular to standing walls) even at viewing angles 60° from the normal. Diffraction is at characterized through measurement of intensity for zeroth through third order diffraction spots. Encapsulation is shown to significantly reduce diffraction. Measurements are supported by optical simulations. Abstract: A novel architecture has been employed to fabricate transparent electrodes with high conductivity and high optical transmittance at high incident angles. Soft lithography is used to fabricate polymer grating patterns onto which thin metallic films are deposited. Etching removes excess metal leaving tall walls of metal. Polymer encapsulation of the structure both protects the metal and minimizes diffraction. Transmission is dependent upon the height of the walls and encapsulation and varies from 60% to 80% for structures with heights of 1400 nm to 300 nm. In encapsulated structures, very little distortion is visible (either parallel to or perpendicular to standing walls) even at viewing angles 60° from the normal. Diffraction is at characterized through measurement of intensity for zeroth through third order diffraction spots. Encapsulation is shown to significantly reduce diffraction. Measurements are supported by optical simulations. 645-650 (1984). Keywords

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TFT-LCD technology

Cited by 140 publications

References 0 publications

Conductance Enhancement Mechanisms of Printable Nanoparticulate Indium Tin Oxide (ITO) Layers for Application in Organic Electronic Devices

Conductance Enhancement Mechanisms of Printable Nanoparticulate Indium Tin Oxide (ITO) Layers for Application in Organic Electronic Devices

Indium-Tin-Oxide for High-performance Electro-optic Modulation

Metal-nanowall grating transparent electrodes: Achieving high optical transmittance at high incident angles with minimal diffraction

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