Tetramethylammonium Hydroxide Poisoning during a Pallet Cleaning Demonstration

Park, Seung-Hyun; Park, Jungsun; You, Ki-Ho; Shin, Hae-Chul; Kim, Hyun-Ock

doi:10.1539/joh.12-0143-cs

Cited by 23 publications

(7 citation statements)

References 5 publications

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“…Regarding anisotropic wet etching, KOH (potassium hydroxide) is the most popular inorganic etchant conventionally used [8]. Although other etchants succeed in achieving a better smoothness, such as the organic compound TMAH (tetramethyl ammonium hydroxide), these are considerably more costly and in most cases neurotoxic, thus presenting a huge health risk that requires the appropriate safety measurements [9][10][11].…”

Section: Introductionmentioning

confidence: 99%

Dynamic Wet Etching of Silicon through Isopropanol Alcohol Evaporation

et al. 2015

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Abstract:In this paper, Isopropanol (IPA) availability during the anisotropic etching of silicon in Potassium Hydroxide (KOH) solutions was investigated. Squares of 8 to 40 µm were patterned to (100) oriented silicon wafers through DWL (Direct Writing Laser) photolithography. The wet etching process was performed inside an open HDPE (High Density Polyethylene) flask with ultrasonic agitation. IPA volume and evaporation was studied in a dynamic etching process, and subsequent influence on the silicon etching was inspected. For the tested conditions, evaporation rates for water vapor and IPA were determined as approximately 0.0417 mL/min and 0.175 mL/min, respectively. Results demonstrate that IPA availability, and not concentration, plays an important role in the definition of the final structure. Transversal SEM (Scanning Electron Microscopy) analysis demonstrates a correlation between microloading effects (as a consequence of structure spacing) and the angle formed towards the (100) plane.

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Section: Introductionmentioning

confidence: 99%

Dynamic Wet Etching of Silicon through Isopropanol Alcohol Evaporation

et al. 2015

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“…Systemic toxicity may develop in patients exposed to a relatively lower TMAH concentration (2.38% TMAH) [7,22] or exposure involving a smaller TSBA (5% TBSA). Fatalities have been reported in patients exposed to 4% TMAH involving 7% TBSA [22], and 8.75% TMAH involving 12% TBSA [9] as well as 25% TMAH involving 7% TBSA [7]. Of frightened was that all the victims were announced of death upon their arrival to the emergency department, which was approximately within 30 min after the occurrence of TMAH splash.…”

Section: Discussionmentioning

confidence: 99%

“…TMAH is recognized as an alkaline corrosive and a cholinergic agonist that can cause both chemical skin injury and systemic toxicity, as indicated by acute respiratory failure in a rat model [5]. Fatalities have been reported after dermal exposure to TMAH [6][7][8][9][10]. Clinically, the features of systemic TMAH intoxication include generalized weakness, excessive salivation, and dyspnea, which develop within 10-15 min following dermal exposure [6,7].…”

Section: Introductionmentioning

confidence: 99%

Presentations of tetramethylammonium hydroxide dermal exposure and the valuable potential of diphoterine solution in decontamination: a retrospective observational study

Huang

Hall²,

et al. 2020

BMC Pharmacol Toxicol

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Background Tetramethylammonium hydroxide (TMAH) is a quaternary ammonium compound that is both a base corrosive and a cholinergic agonist, and it is widely used in the photoelectric and semiconductor industries. It causes corrosive skin injuries and systemic cholinergic toxicity with death primarily resulting from respiratory failure without efficacious early decontamination. Methods A retrospective observational study was performed of all cases of TMAH exposure reported to the Taiwan Poison Control Center between July 2010 and October 2017. Retrieved medical records were independently reviewed by two trained clinical toxicologists. Results Despite immediate (< 5 min) skin decontamination with copious amounts of tap water, one patient exposed to 25% TMAH involving ≥5% of total body surface area (TBSA) developed significant systemic toxicity. Patients exposed to 25% TMAH involving ≤1% TBSA developed first-degree chemical skin injuries but no systemic toxicity. Among patients exposed to lower concentrations (≤2.38%) of TMAH, the majority only experienced first-degree chemical skin injuries without systemic signs. Patients exposed to 0.5% TMAH involving nearly their entire TBSA developed no chemical skin injuries or systemic toxicity. All patients who had only first-degree chemical skin injuries did not develop systemic toxicity after exposure to either 2.38% or 25% TMAH. Conclusions TMAH acts as an alkaline corrosive and cholinergic agonist. Systemic signs attributable to TMA+ can rapidly lead to respiratory failure and death after dermal exposure. We have demonstrated that an amphoteric solution may be efficacious for skin decontamination on-site immediately to prevent or ameliorate such toxicity. This practice especially carries a valuable potential in managing victims (patients) who have been exposed to those chemicals with immediate life-threatening toxicity (e.g. TMAH), suggesting that its early utilization deserves further study.

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“…TMAOH is readily and rapidly absorbed through the skin, and fatal systemic and acute toxicity may be observed if dermal absorption occurs. Several injuries and deaths have been reported even after exposure to dilute TMAOH solutions. , Therefore, not only should safety glasses, a lab coat, and disposable nitrile gloves be worn when handling TMAOH, but the use of a chemical-resistant apron, chemical splash goggles or face protection, and nitrile gloves (4 mil or 100 μm) with long gauntlets is also highly recommended. The TMAOH container should be kept tightly closed in a dry and well-ventilated place, and the container should be carefully resealed after use.…”

Section: Mxene Synthesis Processmentioning

confidence: 99%

Safe Synthesis of MAX and MXene: Guidelines to Reduce Risk During Synthesis

Shuck

Ventura-Martinez

Goad

et al. 2021

ACS Chem. Health Saf.

140

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MXenes are proven to be promising materials for a wide variety of applications, from electrochemical energy storage to environmental remediation, leading to their increasing popularity in research. With an influx of new researchers focused on MXenes, it is increasingly important to ensure the safe and reliable production of these materials. Herein, we describe the safe synthesis of MXenes, from their precursors (MAX) to the final product (delaminated MXene), focusing on HF-based etching approaches. Using the synthesis of Ti 3 C 2 T x MXene as an example, we discuss safety risks associated with each step of the procedure and demonstrate necessary precautions for the safe, reproducible, and reliable synthesis of MXenes. Finally, we overview the most updated research on MXene safety from a cytotoxicity aspect.

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Tetramethylammonium Hydroxide Poisoning during a Pallet Cleaning Demonstration

Cited by 23 publications

References 5 publications

Dynamic Wet Etching of Silicon through Isopropanol Alcohol Evaporation

Dynamic Wet Etching of Silicon through Isopropanol Alcohol Evaporation

Presentations of tetramethylammonium hydroxide dermal exposure and the valuable potential of diphoterine solution in decontamination: a retrospective observational study

Safe Synthesis of MAX and MXene: Guidelines to Reduce Risk During Synthesis

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