2000
DOI: 10.1002/(sici)1099-0682(199903)2000:3<455::aid-ejic455>3.0.co;2-e
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Tetraazido Complexes of Aluminium, Gallium, and Indium

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Cited by 23 publications
(15 citation statements)
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“…It is known that many isolated or bridged silicon hydroxyls situate on SBA-15 surface. The nucleophility of hydroxyl oxygen atoms determines their facile coordination with the electron-deficient gallium ions of GaCl 3 reagent, thereby facilitating the dissociation of Ga-Cl bond, reducing the chemical potential for the formation of [Ga(N 3 ) 3 ] n adducts [21] and increasing the nucleation density of Ga-N on SBA-15 surface [22].…”
Section: Methodsmentioning
confidence: 93%
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“…It is known that many isolated or bridged silicon hydroxyls situate on SBA-15 surface. The nucleophility of hydroxyl oxygen atoms determines their facile coordination with the electron-deficient gallium ions of GaCl 3 reagent, thereby facilitating the dissociation of Ga-Cl bond, reducing the chemical potential for the formation of [Ga(N 3 ) 3 ] n adducts [21] and increasing the nucleation density of Ga-N on SBA-15 surface [22].…”
Section: Methodsmentioning
confidence: 93%
“…A multiple of hydroxyls on SBA-15 surface conduce to the formation of [Ga(N 3 ) 3 ] n film reasonably. At high temperature, the [Ga(N 3 ) 3 ] n film rolls up, accompanying with its decomposition [21,24].…”
Section: Proposed Mechanism For the Formation Of Gan Nanorodsmentioning
confidence: 99%
“…Gruppe hat in den letzten Jahren einen groûen Aufschwung erlebt [1]. Eine Ursache ist sicherlich die Suche nach neuen brauchbaren Vorstufen fu È r die MOCVD von AlN, GaN und InN [2,3]. Auf der anderen Seite ist aber auch das pra È parative Interesse an neuen Ring-und Ka È figverbindungen gewachsen, um mehr u È ber deren chemische und physikalische Eigenschaften zu erfahren, wobei eine ganze Palette von Darstellungsvarianten zur Verfu È gung steht [4].…”
Section: Introductionunclassified
“…Wie schon fru È her beobachtet [5,6], ist die N c Hex 2 -Gruppe sterisch so anspruchsvoll, daû z. B. mit dem Zentralmetall Ga nur ein monomeres Galliumamid, Ga(N c Hex 2 ) 3 , aufgebaut werden kann, wa È hrend die N(CH 2 Ph) 2 Aufgrund der niedrigen KZ von drei des In-Atoms sollte in 3 eine kurze In±N-Bindung vorliegen, die mit 204 pm dem In±N-Atomabstand in In[N(SiMe 3 ) 2 ] 3 [18] entspricht. Eine Verla È ngerung auf 207 bzw.…”
Section: Introductionunclassified
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