Testing micro devices with fringe projection and white-light interferometry

Windecker, Robert; Fleischer, Matthias; Körner, Klaus; Tiziani, Hans J.

doi:10.1016/s0143-8166(01)00038-0

Cited by 37 publications

(22 citation statements)

References 17 publications

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“…The optical transfer function (OTF) of the incoherent system is the Fourier transform of the impulse response, as given by [10] …”

Section: Extending the Depth Of Field Using The Cubic Phase Maskmentioning

confidence: 99%

“…At a different viewpoint, a CCD camera observes the projected fringes through another microscope and a phase mask. Phases of the fringes are extracted by the Fourier transform method [8] calibration approaches [10,11], depth information can be identified from the phases of the fringes. The phase mask enlarges the depth of field of the image acquisition system, while the wide-angle eyepiece lens increases the depth of focus of the fringe projection system.…”

Section: Introductionmentioning

confidence: 99%

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3D shape sensing using a phase mask to extend the depth measuring range

Hsu

2010

SPIE Proceedings

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An approach using a phase mask to enlarge the depth measuring range for a 3D shape sensing system is presented. A microscope combined with a wide-angle eyepiece lens is employed to project a fringe pattern onto the inspected surface. A CCD camera observes the projected fringes through another microscope with a phase mask. The phase mask enlarges the depth of field of the image acquisition system, while the wide-angle eyepiece lens increases the depth of focus of the fringe projection system. It is found that the depth measuring range has been extended up to 1600-micron, even though the depth of field of the image acquisition system is only 80-micron.

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“…The optical transfer function (OTF) of the incoherent system is the Fourier transform of the impulse response, as given by [10] …”

Section: Extending the Depth Of Field Using The Cubic Phase Maskmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

3D shape sensing using a phase mask to extend the depth measuring range

Hsu

2010

SPIE Proceedings

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“…These methods are based on the phase calculation for the light scattered in the interferometer arms [3]. Typically, PSI measurement systems use Michelson, Linnik or Mirau interferometers [4], [5]. In this case for surface nanorelief measurement a scanning of interference signal phase is performed by changing the optical path difference of light between reference and measurement interferometer arms [6].…”

Section: Introductionmentioning

confidence: 99%

Interferometric Surface Relief Measurements with Subnano/Picometer Height Resolution

Сысоев

Kosolobov

Kulikov

et al. 2017

Measurement Science Review

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We present an optical interference system nanoprofiler MNP-1 designed for high-precision noncontact measurement of surface relief with subnanometer resolution (root mean square of measured values), based on partial scanning of interference signal. The paper describes the construction of the measurement system with Linnik interferometer and the algorithm for nanorelief surface reconstruction. Experimental measurement results of silicon sample with profile height of surface structure of one interatomic distance obtained by MNP-1 are shown. It was proposed to use an atomically smooth surface as the reference mirror in the interferometer MNP-1 that allowed us to measure monatomic steps of the presented silicon sample. Monatomic steps of 0.31 nm in height on silicon (111) surface were measured with resolution up to 5 pm.

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“…Demonstrated as a micrometer profiling technique suitable for rough surfaces [8][9][10][11][12], it has been employed in ductile fracture investigation [13] profiling [14], and characterization of MEMS membrane deflection [15]. However, the analog depth scanning of most modern FF-LCI techniques is inefficient and burdensome compared to digital stepping, especially with approximate preknowledge of the sample deformation.…”

Section: Introductionmentioning

confidence: 99%