2015
DOI: 10.1063/1.4932091
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Terahertz detection by epitaxial-graphene field-effect-transistors on silicon carbide

Abstract: We report on room temperature detection of terahertz radiation by means of antenna-coupled field effect transistors (FETs) fabricated using epitaxial graphene grown on silicon carbide. The achieved photoresponsivity (similar to 0.25 V/W) and noise equivalent power (similar to 80 nW/root Hz) result from the combined effect of two independent detection mechanisms: over-damped plasma wave rectification and thermoelectric effects, the latter ascribed to the presence of carrier density junctions along the FET chann… Show more

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Cited by 62 publications
(45 citation statements)
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“…The combination of a sudden evaporation of S at the growth temperature of 900°C and high reactant flow rates, were found to balance the competing processes of sublimation, reaction, transfer, diffusion and precipitation of the reactants in favor of fast and dense WS 2 growth. WS 2 synthesis was performed on h-BN flakes exfoliated on quartz, CVD graphene transferred on quartz, and epitaxial graphene on silicon carbide (SiC) [17,18]. The choice of transparent substrates anticipates the use of the investigated heterostacks for optoelectronic applications.…”
Section: Ws 2 Growthmentioning
confidence: 99%
“…The combination of a sudden evaporation of S at the growth temperature of 900°C and high reactant flow rates, were found to balance the competing processes of sublimation, reaction, transfer, diffusion and precipitation of the reactants in favor of fast and dense WS 2 growth. WS 2 synthesis was performed on h-BN flakes exfoliated on quartz, CVD graphene transferred on quartz, and epitaxial graphene on silicon carbide (SiC) [17,18]. The choice of transparent substrates anticipates the use of the investigated heterostacks for optoelectronic applications.…”
Section: Ws 2 Growthmentioning
confidence: 99%
“…Bilayer graphene, buffer layer, and QFMLG samples were obtained on the silicon-terminated face of insulating silicon carbide (4H-SiC (0001)) [CREE Inc.] in a resistively heated cold-wall reactor [Aixtron HT-BM] [33,34]. First, the SiC (0001) substrates were hydrogen-etched for 5 minutes at a temperature of about 1300 °C and a pressure of 450 mbar, in order to obtain atomically flat surfaces [35].…”
Section: Growth Of Graphene Layersmentioning
confidence: 99%
“…The samples for the optical experiments were obtained by thermal decomposition of the silicon face of silicon carbide (SiC) [24]. In this case, the interface between bilayer graphene and the SiC substrate is formed by a carbon buffer layer.…”
Section: Methods Sample Growthmentioning
confidence: 99%
“…We excited epitaxial bilayer graphene grown on SiC(0001) [24,25], both in and out of resonance with the in-plane bond-stretching E 1u phonon at 200 meV (6.3 µm wavelength). The electronic properties of the driven state were then measured with both TeraHertz time-domain spectroscopy (THz TDS, Fig.…”
Section: Introductionmentioning
confidence: 99%