1996
DOI: 10.1016/0921-5093(96)10253-7
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Tensile and fracture behavior of free-standing copper films

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Cited by 88 publications
(47 citation statements)
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“…For the case of electron beam-evaporated 0.26-m-thick Cu freestanding films, similar results were obtained in in situ TEM tensile tests (10). The stress level at the onset of plastic deformation and the rate of hardening were similar to those reported in ref.…”
supporting
confidence: 76%
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“…For the case of electron beam-evaporated 0.26-m-thick Cu freestanding films, similar results were obtained in in situ TEM tensile tests (10). The stress level at the onset of plastic deformation and the rate of hardening were similar to those reported in ref.…”
supporting
confidence: 76%
“…For instance, in the in situ TEM tensile tests reported in ref. 10, the limited ductility of the films during straining is explained by a low number of available dislocation sources with the most likely sites for nucleation being grain boundaries. This feature is also consistent with other in situ TEM observations showing dislocations bowing away from grain boundaries and moving outward from the grains during straining (19,20).…”
Section: The Computational Modelmentioning
confidence: 99%
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“…Piezoelectric device (Keller et al, 1996;Liu et al, 2009;Tsuchiya et al, 2000) and electromagnetic actuator (Kim & Huh, 2011;Komai et al, 1998), which can control nanometer order displacement, are used as an actuator. Load is measured by means of capacitive load cell (Zhu et al, 2005).…”
Section: Experimental Set-upmentioning
confidence: 99%
“…Consequently, several custom methods optimized for thin film investigations have been developed during the past decades. 6 The most prominent ones are based on static deflection measurements of thin-film specimens such as substrate curvature measurements, 13,14 nanoindentation techniques, [15][16][17] microtensile experiments, [18][19][20][21] and bulge tests. [22][23][24] Dynamic measurement principles utilizing resonance frequency determination of vibrating thin films are also in use.…”
Section: Introductionmentioning
confidence: 99%