1989
DOI: 10.1016/0022-0248(89)90346-1
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TEM investigation of modulated structures and ordered structures in InAlAs crystals grown on (001) InP substrates by molecular beam epitaxy

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Cited by 57 publications
(20 citation statements)
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“…Observations of composition-modulated structures refer to as-grown samples, and there are no experimental data on the formation of composition-modulated structures via annealing of a semiconductor alloy. Such modulated structures have been observed in III-V semiconductor alloys grown by liquid-phase epitaxy, 25-31 by vapor-phase epitaxy, 32 by metal-organic vapor phase epitaxy, [33][34][35] and by molecular-beam epitaxy, 30,34,36 and in II-VI semiconductor alloys grown by MBE. 37 Bulk diffusion coefficients in semiconductors are several orders of magnitude smaller than those in metals.…”
Section: Semiconductor Alloys Versus Metal Alloysmentioning
confidence: 80%
See 1 more Smart Citation
“…Observations of composition-modulated structures refer to as-grown samples, and there are no experimental data on the formation of composition-modulated structures via annealing of a semiconductor alloy. Such modulated structures have been observed in III-V semiconductor alloys grown by liquid-phase epitaxy, 25-31 by vapor-phase epitaxy, 32 by metal-organic vapor phase epitaxy, [33][34][35] and by molecular-beam epitaxy, 30,34,36 and in II-VI semiconductor alloys grown by MBE. 37 Bulk diffusion coefficients in semiconductors are several orders of magnitude smaller than those in metals.…”
Section: Semiconductor Alloys Versus Metal Alloysmentioning
confidence: 80%
“…Experimental data indicate a number of compositionmodulated structures which are formed both in III-V semiconductor alloys in the process of liquid phase epitaxy, [25][26][27][28][29][30][31] in the process of chemical vapor deposition, [32][33][34][35] and in the process of molecular-beam epitaxy ͑MBE͒, 30,34,36 and in II-VI semiconductor alloys in the process of MBE. 37 The difference between metal alloys and semiconductor alloys in formation mechanisms and conditions for the observation of composition-modulated structures is discussed in Sec.…”
Section: Introductionmentioning
confidence: 99%
“…In addition to the classical model of Langmuir [I], recent pseudopotential calculations [29,30] on the Na/Si(lll), K/Si(IOO)2xl,K/Si(lll)2xl and Na/Si(IOO)2xl systems found a very short K-Si bond length at 2.59 A for the K/Si(IOO)2xl system, resulting in a very strong ionic bonding with a complete charge transfer to the surface and silicon surface metallization [30]. The K-Si distance was measured experimentally by SEXAFS to be 3.14 A at one K monolayer which corresponds to the exact sum of K and Si covalent radii [35]. The K-Si distance was measured experimentally by SEXAFS to be 3.14 A at one K monolayer which corresponds to the exact sum of K and Si covalent radii [35].…”
Section: -Alkali Metal/group IV Semiconductor Interfaces: Electronicmentioning
confidence: 99%
“…This behavior is typical of the formation of an electronic interface state (peak C). Because of the low temperatures of desorption of alkali metals, 550°C for Na [23,24,37], 600°C for K [35,38,39], 650°C for Rb [37,39] and Cs [23,24,37], the covalent bonding between alkali metal and silicon atoms is weak. The only two possible candidates in this energy range are the Si 3p and Na 3s valence electrons.…”
Section: -Alkali Metal/group IV Semiconductor Interfaces: Electronicmentioning
confidence: 99%
“…Some studies concerning several kinds of ordered structures in ternary semiconductors, such as CuAu, [12][13][14] chalcopyrite, [15][16][17] and CuPt, 18 -20 have been reported. However, studies concerning the origins of the coexistence of ordered structures in group II-VI/III-VI heterostructures have not been performed yet.…”
Section: Introductionmentioning
confidence: 99%