Proceedings of the 2004 International Symposium on Physical Design 2004
DOI: 10.1145/981066.981091
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Technology, performance, and computer-aided design of three-dimensional integrated circuits

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Cited by 120 publications
(66 citation statements)
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“…The network based communication infrastructures and three-dimensional (3-D) designs offer low power and high speed where multiple device layers are stacked together. The emergence of 3-D circuits provides an opportunity to reduce the wire length of global interconnects, resulting in an increase in performance and decrease in the power consumption [4,6]. The 3-D architecture reduces wiring length by a factor of √ , where is the number of layers used in NoC [8].…”
Section: Related Workmentioning
confidence: 99%
“…The network based communication infrastructures and three-dimensional (3-D) designs offer low power and high speed where multiple device layers are stacked together. The emergence of 3-D circuits provides an opportunity to reduce the wire length of global interconnects, resulting in an increase in performance and decrease in the power consumption [4,6]. The 3-D architecture reduces wiring length by a factor of √ , where is the number of layers used in NoC [8].…”
Section: Related Workmentioning
confidence: 99%
“…Though TSVs are wider than typical metal wires, TSVs have very short height, since each wafer is thinned to only tens of microns. After fabrication, each wafer is thinned to only 10-100 µm in thickness [3,14], and then TSVs that have pitches of only 4-10 µm 0 are etched through a bulk silicon. Lastly, thermo-compression is used to bond individual layers together to form the 3D integration structure [27].…”
Section: Related Workmentioning
confidence: 99%
“…State-of-the-art 3D integration employs thin dies that results in d2d via lengths from 5 µm to 20 µm [9]. Assuming a d2d via length of 10 µm, the worst-case capacitance of a d2d via surrounded by 8 other vias is computed as 0.594e-15 F/µm.…”
Section: Interconnect Evaluationmentioning
confidence: 99%
“…The total power consumed by all 1409 vias adds up to only 15.49 mW. State-of-the-art width of each via is 5 µm [9]. The area overhead for all the vias is 0.07 mm 2 assuming that the width and spacing between each via is 5 µm.…”
Section: Interconnect Evaluationmentioning
confidence: 99%