Tailoring of titanium thin film properties in high power pulsed magnetron sputtering

Wu, Baohua; Yu, Yang; Wu, Jian; Shchelkanov, Ivan; Ruzic, D. N.; Huang, Nan; Leng, Y.X.

doi:10.1016/j.vacuum.2018.01.039

Cited by 22 publications

(11 citation statements)

References 50 publications

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“…In this study, the column-free and denser microstructure of Cr 2 AlC MAX phase coatings deposited by HiPIMS is exclusively different from the structures reported previously [ 28 , 32 , 55 , 56 , 57 , 58 ]. The improved microstructure of the Cr 2 AlC MAX phase coatings is responsible for enhanced hardness and modulus (discussed later).…”

Section: Resultscontrasting

confidence: 79%

Fabrication and Mechanical Properties of Cr2AlC MAX Phase Coatings on TiBw/Ti6Al4V Composite Prepared by HiPIMS

Qureshi

Tang

et al. 2021

Materials

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The high-power impulse magnetron sputtering (HiPIMS) technique is widely used owing to the high degree of ionization and the ability to synthesize high-quality coatings with a dense structure and smooth morphology. However, limited efforts have been made in the deposition of MAX phase coatings through HiPIMS compared with direct current magnetron sputtering (DCMS), and tailoring of the coatings’ properties by process parameters such as pulse width and frequency is lacking. In this study, the Cr2AlC MAX phase coatings are deposited through HiPIMS on network structured TiBw/Ti6Al4V composite. A comparative study was made to investigate the effect of average power by varying frequency (1.2–1.6 kHz) and pulse width (20–60 μμs) on the deposition rate, microstructure, crystal orientation, and current waveforms of Cr2AlC MAX phase coatings. X-ray diffraction (XRD), scanning electron microscopy (SEM), and atomic force microscopy (AFM) were used to characterize the deposited coatings. The influence of pulse width was more profound than the frequency in increasing the average power of HiPIMS. The XRD results showed that ex situ annealing converted amorphous Cr-Al-C coatings into polycrystalline Cr2AlC MAX phase. It was noticed that the deposition rate, gas temperature, and roughness of Cr2AlC coatings depend on the average power, and the deposition rate increased from 16.5 to 56.3 nm/min. Moreover, the Cr2AlC MAX phase coatings produced by HiPIMS exhibits the improved hardness and modulus of 19.7 GPa and 286 GPa, with excellent fracture toughness and wear resistance because of dense and column-free morphology as the main characteristic.

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Section: Resultscontrasting

confidence: 79%

Fabrication and Mechanical Properties of Cr2AlC MAX Phase Coatings on TiBw/Ti6Al4V Composite Prepared by HiPIMS

Qureshi

Tang

et al. 2021

Materials

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“…In work done by Wu et al… [11] they estimate that the flux of target material at the substrate is increased by more than 18 %. In work done by Wu et al… [11] they estimate that the flux of target material at the substrate is increased by more than 18 %.…”

Section: D Conformal Depositionmentioning

confidence: 98%

“…The addition of a positive kick to the HIPIMS cycle enables the rejection of the remaining sputter target ions at the surface of the source forcing them toward the substrate. In work done by Wu et al… [11] they estimate that the flux of target material at the substrate is increased by more than 18 %. By sending a large fraction of ionized sputter target material to the substrate the positive kick pulse boosts the deposition rate of HIPIMS and also contributes more energy to the film that can contribute to adatom mobility.…”

Section: D Conformal Depositionmentioning

confidence: 98%

Enhanced High Power Impulse Magnetron Sputter Processes

Gaines

2019

Vak Forsch Prax

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Summary High power impulse magnetron sputtering (HIPMS) has emerged as a useful approach for depositing highly dense and smooth coatings of electrically conductive materials. Recent advances in power supply technology have further enabled HIPMS through the addition of a positive kick in the pulse cycle which supplies a bias at the surface of the sputter target which expels sputter target ions and sends more charged adatoms toward the substrate. This has been demonstrated with critical materials like diamond‐like carbon and plasmonic materials. Material specific pulse magnitudes and durations can be developed to achieve new novel thin film morphologies.

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“…Additionally, they have outstanding thermal and chemical stability [4] and are widely used in microelectronics [5,6]. Ti thin films are prepared by direct current (DC) sputtering [7][8][9][10][11], radio frequency (RF) sputtering [12], and high-power impulse magnetron sputtering (HiPIMS) [13][14][15] because of their high reproducibility and growth rate.…”

Section: Introductionmentioning

confidence: 99%

Effect of Pressure on the Film Deposition during RF Magnetron Sputtering Considering Charged Nanoparticles

et al. 2021

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Non-classical crystallization, in which charged nanoparticles (NPs) are the building blocks of film growth, has been extensively studied in chemical vapor deposition (CVD). Recently, a similar mechanism of film growth has been reported during radio frequency (RF) sputtering with a Ti target and DC magnetron sputtering using an Ag target. In this study, the effect of pressure on the generation of Ti NPs and on the film deposition was studied during RF sputtering with a Ti target. Ti NPs were captured on transmission electron microscopy (TEM) membranes with the electric biases of −30, 0, and +50 V under 20 and 80 mTorr. The number densities of the Ti NPs were 134, 103, and 21 per 100 × 100 nm2, respectively, with the biases of −30, 0, and +50 V under 20 mTorr and were 196, 98, and 0 per 100 × 100 nm2, respectively, with the biases of −30, 0, and +50 V under 80 mTorr, which was analyzed by TEM. The growth rate of Ti films deposited on Si substrates was insensitive to the substrate bias under 20 mTorr but was sensitive under 80 mTorr, with the thicknesses of 132, 133, 97, and 29 nm, respectively, after being deposited for 15 min with the substrate biases of −30, −10, 0, and +50 V. This sensitive dependence of the film growth rate on the substrate bias under 80 mTorr is in agreement with the sensitive dependence of the number density of Ti NPs on the substrate bias under 80 mTorr.

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Tailoring of titanium thin film properties in high power pulsed magnetron sputtering

Cited by 22 publications

References 50 publications

Fabrication and Mechanical Properties of Cr2AlC MAX Phase Coatings on TiBw/Ti6Al4V Composite Prepared by HiPIMS

Fabrication and Mechanical Properties of Cr2AlC MAX Phase Coatings on TiBw/Ti6Al4V Composite Prepared by HiPIMS

Enhanced High Power Impulse Magnetron Sputter Processes

Effect of Pressure on the Film Deposition during RF Magnetron Sputtering Considering Charged Nanoparticles

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