T-shape filtered arc deposition system with built-in electrostatic macro-particle trap for DLC film preparation

Abstract

The T-shape filtered arc deposition system (T-FAD) is a powerful tool to prepare high-quality diamond-like carbon (DLC) films. Most macro-particles (droplets) emitted from the graphite cathode are caught at the extension duct of the droplet catcher or collector facing the cathode, and then the clean plasma bent 90 degrees is transported toward the substrate. However, further droplet reduction is still required in order to realize a higher quality film without droplet adhesion. In the present study, T-FAD was evolved by employing an electrostatic droplet trap (ES-trap). A cylindrical ES-trap was placed in the extension duct part of the T-shape duct of an electromagnetic plasma transportation and droplet filter. The ion current at the exit of the T-filter duct and the current flowing to the ES-trap were measured as a function of the ES-trap bias voltage for various positions of the ES-trap. The deposition rate and number of droplets were also measured. As a result, it was found that the optimum voltage of the ES-trap was +35 V and that it was better to place the ES-trap closer to the plasma beam in order to obtain fewer droplets on the film without an excessive decrease in the deposition rate. In the optimum condition, the number of droplets on the DLC film prepared with ES-trap was reduced to 1/3 of that without the ES-trap.

Wear-resistive and electrically conductive nitrogen-containing DLC film consisting of ultra-thin multilayers prepared by using filtered arc deposition

“…Harder N-DLC films in the N-DLC films have been prepared by filtered arc deposition (FAD) methods. 3,[18][19][20][21][22][23][24][25][26] The FAD methods are vacuum arc deposition (VAD) methods equipping a filtering duct for removing fine particles called a droplet generated from a cathode. 3,18) In the VAD method, an arc spot that is active at high temperature is formed on a cathode, and the cathode material evaporates.…”

Reduced Roughness and Enhanced Mechanical Properties of Multilayered Diamond-Like Carbon Films by Periodic Arc Deposition

“…17,18 The most effective and popular way to avoid the problem of microparticle inclusion is to employ a magnetic filter that removes microparticles and allows only the transportation of plasma to the substrates. 14,19,20 Nevertheless, the use of a magnetic filter suffers from major drawbacks including a high cost, a complicated tool, a low deposition rate and a limited deposition area. 21,22 Thus in this study, very simple periodic deposition that applies a conventional unfiltered cathodic vacuum arc but intermittent chamber evacuations was attempted for preparing DLC films as well as improving the efficiency of current physical deposition techniques, reducing the surface roughness of conventional unfiltered films, and enhancing the mechanical strength of the films.…”