Wear-resistive and electrically conductive nitrogen-containing DLC film consisting of ultra-thin multilayers prepared by using filtered arc deposition

Abstract

Nitrogen-containing diamond-like carbon (N-DLC) multilayer films approximately 500 nm thick were fabricated on tungsten carbide substrates as surface protective films with high wear-resistive and conductive properties. Each layer thickness of the N-DLC multilayer films was approximately 10 nm, and the films were a periodic bilayer structure consisting of hard and soft N-DLC layers. Owing to the high abrasion resistance of the hard layer and the low aggressiveness and high adhesion of the soft layer, the multilayer films showed good polishing and wear resistances compared with the hard N-DLC monolayer film, and the electrical resistivity was about half. In the case of DLC multilayer films consisting of hard N-free DLC and N-DLC films, the decrease of each layer thickness leads to the reduction of the polishing resistance. From X-ray reflectivity analysis of ultra-thin N-free DLC films, it was indicated that the film density of an ultra-thin N-free DLC film is lower than that of a thick N-free DLC film. In the DLC multilayer film with thin N-free DLC layers, it is possible that the polishing resistance of the whole DLC film reduced because the hardness the N-free DLC layer was decreased due to the low film density of each N-free DLC layer.

Evaluation of Corrosion Resistance of Thin Films Formed on AISI 316L Steel by Plasma Using Hastelloy as Cathodic Cage

“…Therefore, the decisive factor is to conduct higher‐atoms mobility provided by the increase in temperature, obtaining denser coatings, which reduce the number of voids and pores. [ 7 ] Table 2 also shows the microhardness results of the films. So results show that only the film formed at 375 °C shows an increase in microhardness compared with the substrate.…”

“…In the past decades, the deposition of thin films has been a strategic alternative to provide improved surface properties. The development of protective layers on metallic substrates has enabled good wear resistance, [1][2][3][4][5][6][7][8][9][10] corrosion protection, [11][12][13][14][15][16][17][18][19][20][21][22][23][24] enhanced surface hardness, [25][26][27][28][29][30][31][32][33][34] and superior biocompatibility. [18,20,[35][36][37][38][39][40] Plasma deposition procedure is a promising technique that can be used to supply thin films, aiming at applications such as magnetron sputtering, [2,3,6,10,12,18,…”

“…In the past decades, the deposition of thin films has been a strategic alternative to provide improved surface properties. The development of protective layers on metallic substrates has enabled good wear resistance, [ 1–10 ] corrosion protection, [ 11–24 ] enhanced surface hardness, [ 25–34 ] and superior biocompatibility. [ 18,20,35–40 ]…”

Effect of Poly Dimethyl Diallyl Ammonium Chloride‐Multiwalled Carbon Nanotubes Concentration on the Microstructure and Friction Behavior of Co‐Doped Diamond‐Like Carbon Films

“…[12][13][14] Diamond-like carbon (DLC) films, a new type of metastable amorphous carbon material containing sp 3 -C and sp 2 -C, [15][16][17][18] are applied in aerospace, mechanical, optoelectronic, biomedical, and other fields because of its excellent lubricity and good tribological characteristics. [19][20][21][22][23] Therefore, the preparation of solid self-lubricating films with excellent friction and wear reduction properties on the surface of titanium is an effective way to improve its surface properties. The known methods of preparing DLC films are physical vapor deposition (PVD), chemical vapor deposition, and ion-beam deposition.…”

Development of gas-injected pulsed plasma CVD method using Ar/C2H2 mixed gas for ultra-high-rate diamond-like carbon deposition

“…[14][15][16][17] DLC films with low nanoindentation hardness also have low wear resistance. [18][19][20][21] Thus, to attain surface protection properties similar to those of ta-C films, the a-C:H films must be considerably thicker than the ta-C films. An a-C:H deposition method faster than conventional plasma CVD methods must be developed to realize a highly productive and practical process for mechanical surface protective coating.…”