Synthetic Multilayers as Bragg Diffractors for X-Rays and Extreme Ultraviolet: Calculations of Performance

Underwood, J. H.; Barbee, Troy W.

doi:10.1063/1.33164

Cited by 82 publications

(19 citation statements)

References 0 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Multilayer mirrors as developed by Barbee [15] appear promising. For a 1 ~ bandwidth an efficiency of 20~ has been obtained and up to 40~ efficiency is theoretically possible [16).…”

Section: T~ggler Beam Line Strategiesmentioning

confidence: 99%

<title>X-Ray Lithography Using Wiggler And Undulator Synchrotron Radiation Sources</title>

Neureuther¹,

Kim

Thompson

et al. 1984

X-Ray Lithography and Applications of Soft X-Rays to Technology

View full text Add to dashboard Cite

“…Multilayer mirrors as developed by Barbee [15] appear promising. For a 1 ~ bandwidth an efficiency of 20~ has been obtained and up to 40~ efficiency is theoretically possible [16).…”

Section: T~ggler Beam Line Strategiesmentioning

confidence: 99%

<title>X-Ray Lithography Using Wiggler And Undulator Synchrotron Radiation Sources</title>

Neureuther¹,

Kim

Thompson

et al. 1984

X-Ray Lithography and Applications of Soft X-Rays to Technology

View full text Add to dashboard Cite

“…4 Reflectivity is the most critical parameter determining the performance of the mirrors. However, the reflectivity of a multilayer in the 6 nm region is generally very low for two reasons.…”

Section: Introductionmentioning

confidence: 99%

Multilayer mirrors for µ‐XPS using a Schwarzschild objective

Takenaka

Ichimaru

Nagai

et al. 2005

Surface & Interface Analysis

View full text Add to dashboard Cite

The development of highly reflective multilayer mirrors for use in the wavelength region around 6 nm has made it possible to use a multilayer-coated Schwarzschild objective for micro-x-ray photoemission spectroscopy. For this purpose, Co x Cr 1−x /C and W/C multilayers were fabricated by magnetron sputtering and the soft x-ray reflectivities were measured. The peak reflectivity of the Cr/C multilayer was found to be the highest with ∼18.9% at a wavelength of 6.42 nm and an incident angle of 88• . It is believed that a Cr/C multilayer will provide sufficient performance for use on a Schwarzschild mirror for x-ray photoemission spectroscopy using 6 nm x-rays.

show abstract

“…Tt has been shown mathen,atically [5] th~t the reflectivity is a maximum for an nbsorber layer thickness co layer spacing ratio of 0.4. Figure 7 jll(:strates the change in reflectivity as a function of the absorber lsyer (WC) thirknc~~for M-3H, M-39, and M-40.~'or Our c~se it is optimum nwar n ratio of 0.33.…”

Section: Fabricationmentioning

confidence: 99%

Auger and depth profile analysis of synthetic crystals for dispersion of soft x-rays

Rachocki

Brown

Springer

et al. 1984

Applications of Surface Science

View full text Add to dashboard Cite

Numerous samples have been fabricated and analyzed as part ot c program to produce soft X-ray dispersion elements for various laboratory applications.The majority of this work has centered around the carbon/tun~stcn Eyfitcm, although several other low-Z/high-Z pairs have been Investisatcd. This report descrlhe~the dcvclopmcnt of certain vacuum-dcposltlon tc:hlliquc.for fabricating these dispersion elements, based upon results obta~ll~'d frc~m X-r:]?

show abstract

Synthetic Multilayers as Bragg Diffractors for X-Rays and Extreme Ultraviolet: Calculations of Performance

Cited by 82 publications

References 0 publications

<title>X-Ray Lithography Using Wiggler And Undulator Synchrotron Radiation Sources</title>

<title>X-Ray Lithography Using Wiggler And Undulator Synchrotron Radiation Sources</title>

Multilayer mirrors for µ‐XPS using a Schwarzschild objective

Auger and depth profile analysis of synthetic crystals for dispersion of soft x-rays

Contact Info

Product

Resources

About