Synthesis of two aminosilanes as CVD precursors of SiC_xN_yfilms: Tuning film composition by Molecular Structures

1,4-Bis(trimethylsilyl)piperazine—Thermal Properties and Application as CVD Precursor

“…The desired properties of SiC x N y films are achieved by the optimization of the deposition process, including the choice of the proper precursor and deposition parameters. (b) Given that the properties of the films, in addition to the above parameters, are affected by the geometry of the reactor, it is interesting to identify the influence of the design of the precursors in a series of works in which the processes using various organosilicon compounds were studied with the same experimental setup [15][16][17][18][19][20][21][22]. (c) Films obtained at low synthesis temperatures (below 300 • C) and a low input power of plasma are a polymer-like hydrogenated material.…”