2013
DOI: 10.1016/j.surfcoat.2013.06.088
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Synthesis of nanostructured Pt/oxide catalyst particles by MOCVD process at ambient pressure

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Cited by 17 publications
(16 citation statements)
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“…Trimethyl(methylcyclopentadienyl)platinum(IV), commonly referred to as MeCpPtMe 3 (Abcr) is widely used ( [8,9,[13][14][15]), relatively volatile ( [16]), and rather expensive. The iron precursor Ethylferrocene (EF) (Abcr) is relatively affordable and volatile [17].…”
Section: Cvd Precursorsmentioning
confidence: 99%
See 1 more Smart Citation
“…Trimethyl(methylcyclopentadienyl)platinum(IV), commonly referred to as MeCpPtMe 3 (Abcr) is widely used ( [8,9,[13][14][15]), relatively volatile ( [16]), and rather expensive. The iron precursor Ethylferrocene (EF) (Abcr) is relatively affordable and volatile [17].…”
Section: Cvd Precursorsmentioning
confidence: 99%
“…this regard, CVD offers significant potential, due to its excellent reproducibility and control over the structure of the active phase(s) [7][8][9][10][11].…”
Section: Introductionmentioning
confidence: 99%
“…Through MOCVD metal oxide deposition, no solvents are used, and no further post-treatment, such as calcination, filtration, and drying is required. [45,46] This method also fabricates metal oxide layers with better uniformity and better size distributions because of its inherent characteristics. [47] During the past years, MOCVD has been mostly used in fabrication of thin-layer electronics in the semiconductors industry.…”
Section: Introductionmentioning
confidence: 99%
“…Suitable MOCVD precursors are required to be volatile, thermally stable at vaporization, nontoxic, stable in air and easy to prepare in high yields . Pt forms volatile compounds with methyl, allyl, cyclopentadienyl (Cp) and β‐diketonato ligands . These types of Pt precursors were usually used for a definite purpose.…”
Section: Introductionmentioning
confidence: 99%
“…These types of Pt precursors were usually used for a definite purpose. For example, dimethylplatinum(II) compounds have been used for Pt nanoparticle deposition for catalysts . Trimethylplatinum(IV) compounds with Cp or its derivatives were widely used for deposition of Pt films with compact structure and low roughness for microelectronic and protective coating applications .…”
Section: Introductionmentioning
confidence: 99%