Chemical vapour deposition of platinum films on electrodes for pacemakers: Novel precursors and their thermal properties

Abstract

Air-stable trimethylplatinum(IV) β-diketonate complexes of general formula (CH 3 ) 3 Pt(L)Py (L = R 1 COCHCOR 2 ; R 1 = R 2 = CF 3 (hfac), t Bu (thd), CH 3 (acac); R 1 = CF 3 , R 2 = t Bu (ptac), CH 3 (tfac); Py = pyridine) have been synthesized in high yields. The thermal properties of (CH 3 ) 3 Pt(L)Py were investigated using thermogravimetry/differential thermal analysis and flow method to demonstrate their suitability as metal-organic chemical vapour deposition precursors. Thermolysis of vaporized (CH 3 ) 3 Pt(acac)Py in vacuum and in the presence of hydrogen or oxygen was studied under conditions of low-pressure chemical vapour deposition using an original technique. Using this precursor, Pt films were deposited on electrodes for pacemakers under various conditions. The composition, structure, morphology and electrochemical properties of the deposited films were investigated using X-ray diffraction, X-ray photoelectron spectroscopy, scanning electron microscopy and cyclic voltammetry and LCR measurements. Pt films deposited in the presence of oxygen have a fractal-like morphology as a result the highest values of real surface areas (851-943 mm 2 ) and capacity (5-8.5 μF mm −2 ).

Thermal Chemistry of Metal Organic Compounds Adsorbed on Oxide Surfaces

“…Another family of metal organics with bridge-bonded ligands used in chemical film deposition applications is diketonates. The most common ligands used in this case are the simplest acetylacetonate (acac) − and hexafluoroacetylacetonate (hfac) − moieties, but other diketonates with larger side chains are also known. ,− In many of the reported uses of these compounds the final target has been a metal oxide film, but some examples are also available for the growth of metallic films with these precursors, especially with late transition metals. ,− Although the studies available to date suggest that diketonates may be less reactive on surfaces than amidinates, they are still prone to fragmentation upon thermal activation.…”

Platinum ω-Alkenyl Compounds as Chemical Vapor Deposition Precursors: Synthesis and Characterization of Pt[CH2CMe2CH2CH═CH2]2 and the Impact of Ligand Design on the Deposition Process

“…Today, the CVD − ,, and atomic layer deposition (ALD) − of platinum thin films from organoplatinum precursors are of interest for a wide variety of applications, including the fabrication of gate electrodes and other microelectronic structures, , as catalysts, − as a component of data storage media, and as electrical contacts in medical devices. − …”

Volatile Iridium and Platinum MOCVD Precursors: Chemistry, Thermal Properties, Materials and Prospects for Their Application in Medicine

“…Two synthetic approaches to obtain Me 3 Pt(L)A (A = H 2 O, Py) complexes with βdiketonate ligands are known. The earlier one is similar to those described in [99] and based on the reaction of [Me 3 PtI] 4 with potassium β-diketonates [100,101]. A shift in the equilibrium towards the target Me 3 Pt(L)A product is achieved by AgF introducing, which leads to the formation of an AgI precipitate.…”