Synthesis of nano-crystalline zirconium aluminium oxynitride (ZrAlON) composite films by dense plasma Focus device

Role of Nitrogen Pressure on the Structural and Mechanical Properties of ZrON Composite Films Deposited by Plasma Focus Device

“…The ion energy flux on substrate surface is related to the focusing efficiency of PF device which is indicated by the intensity of voltage probe signal; more intense the voltage probe signal, higher will be the ion energy flux [36,37,39]. Moreover, the intensity of voltage probe signal depends on the working gas pressure (Fig.…”

“…It is a source of neutrons, X-rays, highly energetic ions and relativistic electrons [29][30][31]. These energetic ions and relativistic electrons have been used to deposit different films of industrial applications [32][33][34][35][36][37][38][39][40][41][42][43].…”

Role of charge particles irradiation on the deposition of AlN films using plasma focus device

“…It is a source of neutrons, X-rays, highly energetic ions and relativistic electrons [17,18]. These energetic ions have been used: (i) for processing of various thin films [19][20][21] by irradiating them at different axial positions from the anode for implantation of nitrogen [22] and carbon [23] ions into different substrates, and (ii) for deposition of thin films of carbon [24], titanium carbide [25], titanium nitride [26], zirconium nitride [27], zirconium oxynitride [28] and zirconium aluminium oxynitride [29].…”

Zirconium nitride nano-particulate reinforced Alon composites: Fabrication, mechanical properties and toughening mechanisms

“…[20][21][22][23] Khan et al 24 studied the crystal structure, surface morphology, elemental distribution and microhardness of ZrAlON film. A Table 1 The composition of raw powders (in wt%) selected for fabricating the ZrN-Alon composites in the present study.…”