Role of charge particles irradiation on the deposition of AlN films using plasma focus device

Khan, Ijaz Ahmad; Rawat, Rajdeep Singh; Verma, Rishi; Macharaga, G.; Ahmad, Riaz

doi:10.1016/j.jcrysgro.2010.12.070

Cited by 17 publications

(10 citation statements)

References 46 publications

(48 reference statements)

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“…Hot corrosion behaviour of the coating specimens was performed in a tube furnace. After washing with acetone, specimens were primarily preheated to 2008C and subsequently sprayed with a 90 wt-% Na 2 SO 4 þ NaCl solution with ,5 mg cm 22 of corrosive mixture at a distance of 50 cm. The volume used to dissolve the…”

Section: Methodsmentioning

confidence: 99%

Coating of Ni–Al–N ions on Nimonic 75 alloy by 4 kJ plasma focus device

Habibi

Laktarashi

Bordbar

2016

Corrosion Engineering, Science and Technology

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In this paper, the deposition of Ni-Al-N coatings on Nimonic 75 substrates using a 4 kJ plasma focus device for 30 shots is investigated. The results obtained by field emission scanning electron microscopy and X-ray diffraction (XRD) tests confirm the formation of Ni-Al-N nanoparticles on the surface of the samples with an average crystalline size of ,20-50 nm. The hot corrosion rate was determined by measuring the weight gain of the samples at 8008C. Improvement of charge transfer resistance by electrochemical impedance spectroscopy reveals that the coated layer can significantly increase resistance to corrosion.

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Section: Methodsmentioning

confidence: 99%

Coating of Ni–Al–N ions on Nimonic 75 alloy by 4 kJ plasma focus device

Habibi

Laktarashi

Bordbar

2016

Corrosion Engineering, Science and Technology

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“…More detailed information's about ion velocity, ion energy and ion number density are found in the literature and it is found that the ion energy and ion number density are ranged from keV to MeV and 10 19 m -3 respectively [36][37][38][51][52][53][54][55]. For more detailed emission characteristics of ions emanated from PF devices, the readers are advised to refer to the recent work by Lee and Saw [47].…”

Section: Methodsmentioning

confidence: 99%

“…It is a source of neutrons, X-rays, highly energetic ions and relativistic electrons [29][30][31]. These energetic ions and relativistic electrons have been used to deposit different films of industrial applications [32][33][34][35][36][37][38][39][40][41][42][43].…”

Section: Introductionmentioning

confidence: 99%

Role of Nitrogen Pressure on the Structural and Mechanical Properties of ZrON Composite Films Deposited by Plasma Focus Device

et al. 2015

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Polycrystalline zirconium oxy-nitride (P-ZrON) composite films are deposited on Zr substrates by plasma focus device. The focusing efficiency of plasma focus is maximum at 1.5 mbar nitrogen pressure (NP) due to more intense signal of high voltage probe. The P-ZrON composite films are deposited for 25 focus shots at different NP. The XRD patterns confirm the evolution of ZrN (111), Zr 3 N 4 (230), Zr 3 N 4 (320), Zr 3 N 4 (140), Zr 3 N 4 (340) and ZrO 2 (200) diffraction planes. The peak intensity of different diffraction planes and their broadening are associated with increasing NP. The (N ? O)/Zr atomic ratio's are found to be 0.78, 0.88, 1.31, 0.66 and 0.55 at 0.5, 1.0, 1.5, 2.0 and 2.5 mbar NP respectively. The variation in crystallite size of different planes and strain transformation observed in various planes are attributed to varying ion energy fluxes which are associated with the increase of NP. The lattice parameter of ZrN is found to be 0.461 nm at 0.5 mbar NP which is decreased to 0.457 nm at 1.5 mbar NP. The weight fractions of ZrN, Zr 3 N 4 and ZrO 2 phases deposited at 2.5, 2 and 1.5 mbar NP are found to 30.5, 28.5 and 41 % respectively. The SEM microstructures reveal that the size and shape of nano-particles and the formation of complicated network of nano-wires (diameter = * 55 nm) and nano-combs are associated with increasing NP. The AFM images show the maximum rms surface roughness of P-ZrON composite film when deposited at 1.5 mbar NP. The micro-hardness (8623 ± 0.95 MPa) of P-ZrON composite film deposited at 1.5 mbar NP is found to be four times the micro-hardness of virgin Zr.

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“…High hardness of Si 3 N 4 film makes it suitable as cutting tools [4] and crucibles for molten metals [5]. Si 3 N 4 films are being synthesized by a variety of methods such as reactive sputtering [6], PECVD [7], CVD [8] and Plasma Focus Device [9][10][11][12] etc.…”

Section: Introductionmentioning

confidence: 99%

Role of argon plasma on the structural and morphological properties of silicon nitride films by pulsed DC glow discharge

Abbas

Ahmad

Khan³

et al. 2013

2013 International Conference on Aerospace Science &Amp; Engineering (ICASE)

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The role of argon gas concentration on silicon nitride layer formation by using Pulsed dc glow discharge is investigated by exposing Si (100) to different N 2 /Ar plasma for 4 hrs at 2 mbar pressure and 175 W power. XRD results show the development of different planes of silicon nitride which confirms the formation of silicon nitride films. The peak broadening, overlapping and shifting from their stress free values are attributed to the argon nitrogen plasma concentrations. SEM results show the formation of nitride film. AFM images shows that silicon nitride films are rough in nature and their roughness is increased with argon. Maximum surface roughness is observed for 20% argon while minimum surface roughness is observed at 10% argon content in nitrogen-argon plasma.

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Role of charge particles irradiation on the deposition of AlN films using plasma focus device

Cited by 17 publications

References 46 publications

Coating of Ni–Al–N ions on Nimonic 75 alloy by 4 kJ plasma focus device

Coating of Ni–Al–N ions on Nimonic 75 alloy by 4 kJ plasma focus device

Role of Nitrogen Pressure on the Structural and Mechanical Properties of ZrON Composite Films Deposited by Plasma Focus Device

Role of argon plasma on the structural and morphological properties of silicon nitride films by pulsed DC glow discharge

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