Synthesis of magnetic nanoparticles by low-energy dual ion implantation of iron and nickel into silicon dioxide followed by electron beam annealing

Abstract

Magnetic nanoparticles have been made by low-energy dual ion implantation of iron and nickel into SiO 2 with a nickel fluence ratio of 82% followed by electron beam annealing for 1800 s at 1000°C. After annealing, there is significant diffusion of iron and nickel into the silicon dioxide layer. Annealing also led to the formation of superparamagnetic nanoparticles with a narrow particle size distribution. The saturation moment at 5 K was 0.7 µ B

New Approach to Non-Volatile Metal Ion Production Using Plasma Ion Source with Internal Evaporator

“…It was also shown that Ni + implantation followed by annealing leads to formation of magnetic nanoparticles e.g. in silicon [22], SiO 2 [23] or ZnO [24]. A similar combination of Ni + implantation and annealing enables change of optical properties of sapphire [25].…”