Synthesis of Diamond Using RF Magnetron Methanol Plasma Chemical Vapor Deposition Assisted by Hydrogen Radical Injection

Abstract

A new plasma chemical vapor deposition (P-CVD) system was developed for synthesis of diamond. This system consisted of a parallel-plate radio frequency (RF) (13.56 MHz) plasma reactor, with a radical source using a microwave (2.45 GHz) discharge plasma and substrate heating using a cw-CO2 laser. In this system, hydrogen (H) radicals were generated in the microwave H2 plasma and preferentially injected near the substrate in the parallel-plate RF magnetron methanol ( CH3OH) plasma region. By scanning electron microscope (SEM) and X-ray diffraction (XRD) analyses, it was found that diamond was successfully synthesized using this system. The effects of H radical on the diamond formation were also investigated from the results of optical emission measurements in the RF plasma region, thin-film deposition and etching of the nondiamond phases by varying amounts of H radical injection.

Application of mid-infrared tuneable diode laser absorption spectroscopy to plasma diagnostics: a review

“…investigating the influence of rare gases on the plasma. They have also combined IR absorption with emission spectroscopy and investigated the effect of water vapour on the methyl radical concentration in argon/methane and argon/methanol RF plasmas using TDLAS [17,18,[41][42][43]. Kim…”

“…investigating the influence of rare gases on the plasma. They have also combined IR absorption with emission spectroscopy and investigated the effect of water vapour on the methyl radical concentration in argon/methane and argon/methanol RF plasmas using TDLAS [17,18,[41][42][43]. Kim et al measured CH 3 , C 2 H 2 and CH 3 OH concentrations in methanol/water RF plasmas by TDLAS and found that methanol was almost completely dissociated even at medium applied power levels [44].…”

Fabrication of Two-Dimensional Carbon Nanostructures Using Radio-Frequency Plasma-Enhanced Chemical Vapor Deposition

“…The experimental setup used in this study has been described in detail elsewhere [2,3]. Figure 1 shows a schematic diagram of rf PECVD assisted by a remote radical source, which consists of a parallel-plate rf (13.56 MHz) CCP region and a remote radical source which uses an inductively coupled H 2 plasma (H 2 ICP).…”

“…In the case of films fabricated by the plasma-enhanced chemical vapor deposition (PECVD) technique, surface morphology can be effectively controlled not only by optimizing the substrate temperature and bias, but also by the inclusion of specific reactive species as appropriate to the film growth and nucleation. Previously, we have demonstrated the formation of diamond crystals using a unique PECVD system that consists of a parallel-plate radio-frequency (rf) capacitively coupled plasma (CCP) assisted by a hydrogen (H) radical source [2,3]. In the present work, carbon nanowalls were successfully fabricated on silicon (Si) substrates without catalyst, using rf PECVD assisted by H radical injection.…”

High sensitivity of a carbon nanowall-based sensor for detection of organic vapours

“…The experimental setup used in this study is described in details elsewhere. 23,24 The system consists of surface wave plasma (SWP) region driven by a 2.45 GHz microwave power supply to generate H atoms and a capacitively coupled plasma (CCP) region generated by a 100 MHz power supply to fabricate nanowalls from CH 4 gas. The high density H atoms were generated at the top of the PECVD system by the SWP system which was operated at 2.54 GHz and injection into the PECVD system.…”