2006
DOI: 10.1088/0963-0252/15/4/s02
|View full text |Cite
|
Sign up to set email alerts
|

Application of mid-infrared tuneable diode laser absorption spectroscopy to plasma diagnostics: a review

Abstract: Within the last decade mid-infrared absorption spectroscopy over a region from 3 to 17µm and based on tuneable lead salt diode lasers, often called tuneable diode laser absorption spectroscopy or TDLAS, has progressed considerably as a powerful diagnostic technique for in situ studies of the fundamental physics and chemistry in molecular plasmas. The increasing interest in processing plasmas containing hydrocarbons, fluorocarbons, organo-silicon and boron compounds has led to further applications of TDLAS beca… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

3
92
0

Year Published

2008
2008
2019
2019

Publication Types

Select...
5
2
1

Relationship

0
8

Authors

Journals

citations
Cited by 101 publications
(95 citation statements)
references
References 123 publications
(217 reference statements)
3
92
0
Order By: Relevance
“…ERSiCOH (nm·s −1 ) = 4.64 × 10 13 [SiF4] − 1.18 (1) where [SiF4] is given in units of 10 13 molecules cm −3 , see Figure 17. Therefore, the concentration of the etching products can be directly used as a measure of the etching rate.…”
Section: Industrial Process Monitoring In Low-pressure Plasmasmentioning
confidence: 99%
See 1 more Smart Citation
“…ERSiCOH (nm·s −1 ) = 4.64 × 10 13 [SiF4] − 1.18 (1) where [SiF4] is given in units of 10 13 molecules cm −3 , see Figure 17. Therefore, the concentration of the etching products can be directly used as a measure of the etching rate.…”
Section: Industrial Process Monitoring In Low-pressure Plasmasmentioning
confidence: 99%
“…Over the last two decades, chemical sensing using mid infrared laser absorption spectroscopy (MIR-LAS) in the molecular fingerprint region from 3 to 20 µm, which contains strong ro-vibrational absorption bands of a large variety of gaseous species, has been established as a powerful in situ diagnostic tool for molecular plasmas [1][2][3][4][5][6]. Quantum cascade lasers (QCL) in particular have played a central role in this field so much so that they have become the infrared light sources of choice for plasma diagnostics in the mid infrared.…”
Section: Introductionmentioning
confidence: 99%
“…Radicals containing carbon and oxygen are of special interest for fundamental studies and for applications in plasma technology. Although hydrogen and hydrocarbon containing plasmas with admixtures of oxygen and nitrogen have been extensively studied [1,20] there is still a lack of experimental data concerning the absolute densities of radicals in these discharges. The hydroxyl radical is known to be one of the main oxidising radicals.…”
Section: General Considerationsmentioning
confidence: 99%
“…The absorption cross sections of SiF 4 and NF 3 have been determined to be molecule The quantum cascade laser system Q-MACS Etch consists of a pulsed infrared QCL source with the laser wavelength tuneable in the range 1027 -1032 cm -1 , optical components, detectors and data acquisition cards controlled by a PC. The laser driver used was a Q-MACS Basic [1,52]. The Q- MACS Basic provides a laser pulse width tuneable between 10 -255 ns and a repetition frequency between 100 Hz -1 MHz.…”
Section: Plasma Diagnostics With High Time Resolutionmentioning
confidence: 99%
“…Tunable diode laser absorption spectroscopy, TDLAS, using such lasers is a powerful and widely used technique for gas sensing applications including environmental monitoring, chemical analysis, plasma spectroscopy and combustion diagnostics [1][2][3]. The use of wavelengths in the spectral range 4-10 μm is advantageous since many important molecular species exhibit strong well-resolved absorption features in this range.…”
Section: Introductionmentioning
confidence: 99%