Synthesis of Diamond Nanoplatelets/Carbon Nanowalls on Graphite Substrate by MPCVD

Abstract

The films composed of carbon nanowalls and diamond nanoplatelets, respectively, can be simultaneously formed on graphite substrate by controlling the hydrogen etching rate during microwave plasma chemical vapor deposition. To modulate the etching rate, two kinds of substrate design were used: a bare graphite plate and a graphite groove covered with a single crystal diamond sheet. After deposition at 1200 • C for 3 hours, we find that dense diamond nanoplatelets were grown on the bare graphite, whereas carbon nanowalls were formed on the grooved surface, indicating that not only reaction temperature but also etching behavior is a key factor for nanostructure formation.

A novel approach of deposition for uniform diamond films on circular saw blades

“…Diamonds are widely used in cutting industries to machine difficult-to-cut materials, such as stones, glasses and ceramics, due to their highest hardness, low friction coefficient, chemical inertness, high thermal conductivity and great wear resistance [1][2][3][4][5][6][7][8][9][10][11][12][13][14][15][16][17][18][19]. Hot filament chemical vapor deposition (HFCVD) technique is popularly employed, to deposit diamond films on cemented carbide (WC-Co) tools [20][21][22][23][24].…”