Synthesis and X-ray powder diffraction characterization of a new niobate crystal NaBa2Li0.6Nb4.8Zn0.2O15

Ouyang, Shuai; Xiao, Jing; Zhang, Gaoke; Liu, Hanxing; He, Fangsheng; Yi, Xie; Wang, Xiang; Jia, Yuanyuan

doi:10.1007/bf02861456

Cited by 6 publications

(7 citation statements)

References 16 publications

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“…The intensity of the light was measured by an Orc Light Measure UV-M02. 1 H NMR spectra were observed at 400 MHz using a JEOL JNM-ECX400 spectrophotometer. Water contact angle was measured using an Eruma M-2010A.…”

Section: Measurementsmentioning

confidence: 99%

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Photoacid- and Photobase-Generating Monomers for Surface Modification of Cured Resin: Application to Novel Resin Mold for UV Imprint

Horii

Yamane

Okamura

et al. 2012

J. Photopol. Sci. Technol.

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Several types of photoacid-and photobase-generating monomers were prepared. These monomers were cured with multi-functional acrylate monomers by irradiation at 365 nm. The surface of the cured resin was exposed to 254nm light to generate hydrophilic surface. Water contact angles of the resin surface having acid units (-SO 3 H or -COOH) and amine units (-NH 2 ) were 25~36 o and 38~43 o , respectively, depending on the resin composition. A mold for UV imprint lithography (UV-IL) was prepared using the cured resin with hydrophilic surface. It was shown that the resin mold could be used for UV-IL without surface treatment using demolding agents.

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Section: Measurementsmentioning

confidence: 99%

“…Photoacid and photobase generators are widely used for polymer synthesis, polymer degradation, and changes in physical property of polymers [1][2][3][4]. They are useful in industrial applications such as imaging, coating, and surface modification of polymers.…”

Section: Introductionmentioning

confidence: 99%

Photoacid- and Photobase-Generating Monomers for Surface Modification of Cured Resin: Application to Novel Resin Mold for UV Imprint

Horii

Yamane

Okamura

et al. 2012

J. Photopol. Sci. Technol.

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“…We are strongly interested in UV light-emitting diodes (UV LEDs) as the light sources for UVcuring technologies due to their long life, high stability, bright output, compactness, and low power requirement. The rapid development of UV LED technologies, especially the extension of deep UV regions [7][8][9][10][11][12][13], encourages us to investigate the application of a cationic photocuring system such as photoacid generators (PAGs) [14][15][16][17][18][19] and photosensitizers [20,21]. From this point of view, we investigated the formulations of photocurable acrylate resins applicable to deep UV LED lamps which emit 265, 285 or 300-nm light [13].…”

Section: Introductionmentioning

confidence: 99%

Photocuring Behaviors of Epoxy Resins using Deep-UV LEDs

Okamura

Niizeki

Ochi

et al. 2017

J. Photopol. Sci. Technol.

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We investigated the formulations of epoxy resins which were used with deep-UV LED lamps. The mixtures of epoxy monomers and photoacid generators (PAGs) were placed on a silicon wafer to form films. The films were irradiated by deep-UV lamps which emit 265, 285 or 300-nm light. The effects of the PAGs, irradiation wavelengths, and film thicknesses on the reactivity were investigated by FT-IR spectroscopy and a photo-DSC study. We found that a sulfonium salt having a thiophenyl moiety was the most effective PAG. We also found that less than 100-m thick films were effectively cured by irradiation from the deep-UV LEDs.

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“…[1][2][3][4] In these reactions, photo-acid generators (PAGs) that generate acids upon irradiation have played an important role. [5][6][7][8] In general, PAGs must have a high sensitivity, a high thermal stability, ability to generate acid and high solubility in solvents and matrixes. It is important that PAGs and acid precursors are non-mutagenic.…”

mentioning

confidence: 99%

Diphenyliodonium Salts with Pyranine Conk as an Environment-friendly Photo-acid Generator and Their Applications to Chemically Amplified Resists

Tarumoto

Miyagawa

Takahara

et al. 2005

Polym J

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ABSTRACT:A diphenyliodonium salt with an environment-friendly dye as anion was designed. This salt was shown to possess photosensitivity suitable for use as a chemically amplified resist at both 365 and 405 nm. PAG of tris(diphenyliodonium) 9-hydroxy-pyrene-1,4,6-trisulfonate had a negative Ames test, showed good thermal stability, and had a decomposition temperature of 199.9C. The quantum yield of acid generation upon irradiation was 0.63. The mechanism of acid generation was intramoleculor electron transfer from the excited dye moiety to the iodonium structure. The photosensitivities of PAG in a polymer with a t-butoxycarbonyl protecting group were 31 and 58 mJ/cm 2 for 365 and 405 nm light, respectively.

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Synthesis and X-ray powder diffraction characterization of a new niobate crystal NaBa2Li0.6Nb4.8Zn0.2O15

Cited by 6 publications

References 16 publications

Photoacid- and Photobase-Generating Monomers for Surface Modification of Cured Resin: Application to Novel Resin Mold for UV Imprint

Photoacid- and Photobase-Generating Monomers for Surface Modification of Cured Resin: Application to Novel Resin Mold for UV Imprint

Photocuring Behaviors of Epoxy Resins using Deep-UV LEDs

Diphenyliodonium Salts with Pyranine Conk as an Environment-friendly Photo-acid Generator and Their Applications to Chemically Amplified Resists

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