2019
DOI: 10.1088/1757-899x/518/3/032057
|View full text |Cite
|
Sign up to set email alerts
|

Synthesis and Characterization of Nanocoatings Thin films by Atomic Layer Deposition for Medical Applications

Abstract: In this work, synthesis and characterization of Al2O3, TiO2and Al2O3 / TiO2hyper thin films, with 25 nm and 50 nm,have been investigated by using Atomic layer deposition method (ALD) at high vacuum (0.27 Torr) onto the cobalt chromium alloy (ASTM F75) and si-wafer (100) substrates. The characterizationshave been investigated using transmission electron microscopy (TEM), scanning electron microscopy (SEM), energy dispersive spectroscopy (EDX), optical profilometer and ellipsometry spectroscopy. Morphological ch… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
2

Citation Types

0
7
0

Year Published

2020
2020
2024
2024

Publication Types

Select...
4
1
1

Relationship

1
5

Authors

Journals

citations
Cited by 7 publications
(7 citation statements)
references
References 5 publications
0
7
0
Order By: Relevance
“…The increased roughness observed in the DLC/TiO2-film samples on the AISI 316L substrate may be attributable to several factors influencing the deposition process. Variations in deposition conditions, such as temperature, pressure, and precursor concentrations, can lead to non-uniform growth of the TiO 2 layer, resulting in surface irregularities [50][51][52][53]. Additionally, interactions between the TiO 2 molecules and the substrate surface may contribute to the formation of rough surface features during the nucleation and growth stages [51,52].…”
Section: Film Thickness and Roughness Measurementsmentioning
confidence: 99%
See 1 more Smart Citation
“…The increased roughness observed in the DLC/TiO2-film samples on the AISI 316L substrate may be attributable to several factors influencing the deposition process. Variations in deposition conditions, such as temperature, pressure, and precursor concentrations, can lead to non-uniform growth of the TiO 2 layer, resulting in surface irregularities [50][51][52][53]. Additionally, interactions between the TiO 2 molecules and the substrate surface may contribute to the formation of rough surface features during the nucleation and growth stages [51,52].…”
Section: Film Thickness and Roughness Measurementsmentioning
confidence: 99%
“…concentrations, can lead to non-uniform growth of the TiO2 layer, resulting in surface irregularities [50][51][52][53]. Additionally, interactions between the TiO2 molecules and the substrate surface may contribute to the formation of rough surface features during the nucleation and growth stages [51,52].…”
Section: Film Thickness and Roughness Measurementsmentioning
confidence: 99%
“…These excitons react at the surface of TiO2 with surrounding water molecules to form reactive species such as hydroxyl (•OH) and superoxide (•O2−) radicals, capable of mineralizing a wide range of organic compounds [3], acting as a photocatalyst material. There have been several papers reporting the disinfection of bacteria, viruses, and other pathogens by photoactive titania [4] [5][6] [7].…”
Section: Introductionmentioning
confidence: 99%
“…The present work describes a parametric study of TiO2 deposition on 304 and 316L stainless steel (SS) substrates via atomic layer deposition (ALD). The atomic layer deposition is an advantageous technique that guarantees the control of the TiO2 film thickness according to the number of deposition cycles that no other deposition technique provides [7] [23]. The TiO2 films were compared after deposition on 304 and 316L substrates to evaluate the film's structure, adhesion, and composition phases (rutile, anatase, and brookite) according to different stainless steel compositions.…”
Section: Introductionmentioning
confidence: 99%
“…thin film with defect-free, and improved localized electrochemical corrosion resistance on artificial saliva at 37 °C. Wadullah et al 5 used the Atomic Layer Deposition (ALD) technique to describe the deposition of 25nm and 50nm thin films of Alumina, Titania, and Alumina/ Titania multilayer thin films on Co-Cr alloy (ASTM F75). The results showed homogeneous thin films with no defects or micro cracks.…”
Section: Introductionmentioning
confidence: 99%