Synthesis and Characterization of Copper-Iron Nitride Thin Films

Abstract

Iron nitride thin films have potential applications in the biomedicine and energy. The magnetic properties of these films can be tuned by incorporating copper nitride. In this study, iron copper nitride thin films have been fabricated by magnetron sputtering technique either by co-sputtering iron nitride and copper nitride or by layer stacking of the materials. The structure, morphology and magnetic properties of the films have been studied by scanning electron microscopy, x-ray diffraction, x-ray reflectivity and vibrating sample magnetometry.

g-C3N4-Mediated Synthesis of Cu2O To Obtain Porous Composites with Improved Visible Light Photocatalytic Degradation of Organic Dyes

“…This observation though not totally unexpected is difficult to comprehend in the present synthesis strategy which is a low-temperature process. Cu 3 N, a metastable semiconducting material with excellent dielectric properties, is conventionally synthesized by radio frequency sputtering, reactive pulsed laser deposition, sputtering, etc. − Some recent reports involve the use of a single source precursor with a 3:1 stoichiometric ratio of Cu/N, resulting in the reasonably low-temperature decomposition to obtain Cu 3 N. − Synthesis of nitrides and oxynitrides by the nitridation of oxides is also a reported process. The Cu 3 N observed by the protocol reported falls in this category.…”

Strain Effects by Surface Oxidation of Cu3N Thin Films Deposited by DC Magnetron Sputtering

“…Various methods have been employed to obtain copper nitride films, such as RF-sputtering [5][6][7][8][9], RF-plasma chemical reactor [10], reactive pulsed laser deposition [11], and activated reactive evaporation [12]. Despite the promising properties of Cu 3 N, large discrepancies reported in the literature about its measured physical properties have hampered the implementation of reliable technological devices.…”