Various methods have been used to fabricate vanadium
dioxide (VO2) thin films exhibiting polymorph phases and
an identical
chemical formula suited to different applications. Most fabrication
techniques require post-annealing to convert the amorphous VO2 thin film into the VO2 (M1) phase. In this study,
we provide a temperature-dependent XRD analysis that confirms the
change in lattice parameters responsible for the metal-to-insulator
transition as the structure undergoes a monoclinic to the tetragonal
phase transition. In our study, we deposited VO2 and W-doped
VO2 thin films onto silica substrates using a high repetition
rate (10 kHz) fs-PLD deposition without post-annealing. The XRD patterns
measured at room temperature revealed stabilization of the monoclinic
M2 phase by W6+ doping VO2. We developed an
alternative approach to determine the phase transition temperatures
using temperature-dependent X-ray diffraction measurements to evaluate
the a and b lattice parameters for
the monoclinic and rutile phases. The a and b lattice parameters versus temperature revealed phase transition
temperature reduction from ∼66 to 38 °C when the W6+ concentration increases. This study provides a novel unorthodox
technique to characterize and evaluate the structural phase transitions
seen on VO2 thin films.