Synergy between dodecylbenzenesulfonic acid and isomeric alcohol polyoxyethylene ether for nano-scale scratch reduction in copper chemical mechanical polishing

Luo, Chen; Xu, Yue; Zeng, Nengyuan; Ma, Tengda; Wang, Chenwei; Liu, Yuling

doi:10.1016/j.triboint.2020.106576

Tribology International

2020

DOI: 10.1016/j.triboint.2020.106576

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Synergy between dodecylbenzenesulfonic acid and isomeric alcohol polyoxyethylene ether for nano-scale scratch reduction in copper chemical mechanical polishing

Chen Luo

Yue Xu

Nengyuan Zeng

et al.

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Cited by 19 publications

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Synergy between dodecylbenzenesulfonic acid and isomeric alcohol polyoxyethylene ether for nano-scale scratch reduction in copper chemical mechanical polishing

Cited by 19 publications

References 96 publications

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