2002
DOI: 10.1109/68.980496
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Symmetrical waveguide devices fabricated by direct UV writing

Abstract: Abstract-Power splitters and directional couplers fabricated by direct UV writing in index matched silica-on-silicon samples can suffer from an asymmetrical device performance, even though the UV writing is carried out in a symmetrical fashion. This effect originates from a reduced photosensitivity in the vicinity of previous exposed areas. The imbalance can be counteracted by an appropriate reduction of the applied scan velocity in areas, where a previous scan has been carried out nearby.

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Cited by 24 publications
(19 citation statements)
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“…The optical layout of the experimental setup is shown in Fig. 1 and is similar to that used in previous work [10], [13]- [15], except for the fact that we now have extended the setup to automatically compensate for the slow drift of the UV beam direction and power. The UV beam has a wavelength of 257 nm and is generated with an intracavity-frequency-doubled argon-ion laser.…”
Section: Methodsmentioning
confidence: 94%
See 2 more Smart Citations
“…The optical layout of the experimental setup is shown in Fig. 1 and is similar to that used in previous work [10], [13]- [15], except for the fact that we now have extended the setup to automatically compensate for the slow drift of the UV beam direction and power. The UV beam has a wavelength of 257 nm and is generated with an intracavity-frequency-doubled argon-ion laser.…”
Section: Methodsmentioning
confidence: 94%
“…The length of each splitter is roughly 3 mm. The scan velocity used for the input waveguide and the first written output arm is 200 m s. However, a slight reduction of the photosensitivity in the immediate surroundings of exposed areas leads to an asymmetric splitting ratio if the same scan velocity is applied in the second output arm [13]. Optimization showed that equal splitting was achieved when the scan velocity in the second arm was reduced to 70 m s. Making the waveguides join in the middle of the interferometer is not a problem, since the stages have an accuracy of 0.1 m. The MZI arm length as measured between the splitter branching points is 14.8 mm.…”
Section: Voa Designmentioning
confidence: 99%
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“…For the coupler a large bandwidth is achieved for applied scan velocities of 100,900 µm/s in the upper,lower arm of the central coupling region. The splitters are made symmetrical by decreasing the scan speed in one of the output arms to 200 µm/s to compensate for a proximity effect [4]. The total device length is 15 mm and the fabrication time for one component is ~270 seconds.…”
Section: Fabrication and Designmentioning
confidence: 99%
“…The performance of these subcomponents is controlled by tailoring the applied scan velocity during UV writing. Achieving symmetrical Y-branch splitters requires compensation of a proximity effect associated with UV writing [14], which is done by reducing the scan velocity in one of the output arms to 200 µm/s. The coupler section follows an asymmetric design to achieve a large bandwidth.…”
Section: Beam-combiner Layoutmentioning
confidence: 99%