2020
DOI: 10.1007/s11664-020-08113-x
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Switching Transient Analysis and Characterization of an E-Mode B-Doped GaN-Capped AlGaN DH-HEMT with a Freewheeling Schottky Barrier Diode (SBD)

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Cited by 21 publications
(13 citation statements)
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“…The special P-gate is only in SP-SJ HEMT and CS-SJ HEMT for comparison. The gate looks like the letter 'T', and the Mgdoped [22]- [24] p-type GaN cap layer is divided into two pieces with the same size T c . The bottom of the gate and the top of the AlGaN barrier layer are separated by SiN.…”
Section: Device Structures and Parametersmentioning
confidence: 99%
“…The special P-gate is only in SP-SJ HEMT and CS-SJ HEMT for comparison. The gate looks like the letter 'T', and the Mgdoped [22]- [24] p-type GaN cap layer is divided into two pieces with the same size T c . The bottom of the gate and the top of the AlGaN barrier layer are separated by SiN.…”
Section: Device Structures and Parametersmentioning
confidence: 99%
“…A 2000 nm uGaN epitaxial layer was grown on the surface of the buffer layer, on top of which a 150 nm GaN channel layer was grown further. A 1 nm thick AlN insertion layer was grown on the GaN channel to improve the twodimensional electron gas (2DEG) of the device, followed by the growth of a 20 nm-thick undoped AlGaN barrier layer with Al composition of 25% [19]. Finally, a 2 nm thick GaN cap layer was grown on the surface of the barrier layer for protection.…”
Section: Epitaxy Preparationmentioning
confidence: 99%
“…Table 1 and 2 represents the different device parameters and relations used in the present work [13]. Table 3,4,5,and 6 represents the computation of center potential for different channel length (CL), channel height (H), oxide thickness (t ox ), and doping concentration (N d ) respectively. The simulations have been performed using the commercially available Silvaco ATLAS device simulator [16], which is commonly used to characterize the electrical properties of different semiconductor devices.…”
Section: Structure Descriptionmentioning
confidence: 99%