“…This is due to their temperature and frequency stability, low-tuning voltages, relatively low losses, cost, and their fast response [1,2]. Postprocessing of tunable complex oxide thin films became a common practice to establish or improve dielectric properties of these films [3] grown by such methods as metallo-organic solution deposition (MOSD) [4], RF magnetron sputtering [5][6][7][8][9], metal-organic chemical vapor deposition (MOCVD) [10], and others. In addition to improving the crystallinity of the thin films, this postgrowth processing allows augmenting of the oxygen deficiency in the films through various approaches [11].…”