Swelling and modification of silicone surface by F2 laser irradiation

Formation of textured Al thin film on periodic microswelling structure fabricated on silicone rubber surface to realize superhydrophobicity

“…It was also found that with such photochemical surface modification, laser‐irradiated portions swell when being changed into SiO 2 in the course of depolymerization due to photodissociation of main chain structure (Si‐O bonds) of silicone rubber. Moreover, this swelling phenomenon was shown to be induced even with an ArF excimer laser (wavelength: 193 nm), as distinct from modification into SiO 2 . Thus, we confirmed that silicone rubber surface can be provided with superhydrophobicity through local irradiation using an ArF excimer laser to perform depolymerization due to photodissociation of main chain structure, and to create a periodic microswelling structure, without modification into SiO 2 …”

“…Moreover, this swelling phenomenon was shown to be induced even with an ArF excimer laser (wavelength: 193 nm), as distinct from modification into SiO 2 . 19 Thus, we confirmed that silicone rubber surface can be provided with superhydrophobicity through local irradiation using an ArF excimer laser to perform depolymerization due to photodissociation of main chain structure, and to create a periodic microswelling structure, without modification into SiO 2 . [20][21][22] In this paper, we continue the previous research toward further improvement of superhydrophobicity of silicone rubber surface with a periodic microswelling structure; particularly, we show that when Al thin film is deposited, the surface does not become flat, but a fine texture appears.…”

Fs-laser processing of polydimethylsiloxane

“…In particular, UV nanosecond laser pulses (e.g., KrF, ArF, and F 2 ) are largely applied for fabrication of optical elements, 7-9 deposition of thin films, 10-12 modification of optical properties, [13][14][15] and surface processing or functionalization. [16][17][18][19][20][21][22] For example, KrF excimer laser (k ¼ 248 nm) processing of siloxane-based flexible silicone rubber is used to photo-decompose the sample surface changing the surface relief. 2,[22][23][24] Information on the changes to the PDMS structures irradiated by ns-laser pulses is typically obtained by l-Raman measurements.…”

Direct laser etching of hierarchical nanospheres on silicon rubber surface with robust dynamic superhydrophobic stability

“…14 During the laser etching process, carbon was burnt away and silica was mainly left. 23 Therefore, the silicon rubber surface appears white (Figure 2(g)) and the atomic percentage of silicon has a slight increase. The laser modification and silica accumulation are the reasons that the form of the hierarchical nanospheres, resulting in the changes in wettability.…”