IEEE International Integrated Reliability Workshop Final Report, 2004
DOI: 10.1109/irws.2004.1422734
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Survey of oxide degradation in inverter circuits using 2.0 nm MOS devices

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Cited by 4 publications
(13 citation statements)
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“…Since only the pMOSFET experiences wearout, a change in tf is not expected nor is observed. This follows the results of undamaged nMOSFET response in inverters [4]. Additionally, results observed for wearout support the work of Carter et al, in which an increased time delay is simulated in the NAND gate time-domain response (Fig.…”
Section: Introductionsupporting
confidence: 89%
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“…Since only the pMOSFET experiences wearout, a change in tf is not expected nor is observed. This follows the results of undamaged nMOSFET response in inverters [4]. Additionally, results observed for wearout support the work of Carter et al, in which an increased time delay is simulated in the NAND gate time-domain response (Fig.…”
Section: Introductionsupporting
confidence: 89%
“…Similar results obtained through the study of inverter circuits demonstrate pMOSFET wearout is responsible for increased tr [4]. Ultimately, the increase in rise time may affect the critical timing path of digital logic circuits such as clocked registers, which depend on precise timing to function properly.…”
Section: Heffcoxw(vg -Vth )supporting
confidence: 61%
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“…The effects of dielectric breakdown mechanisms on inverter circuit performance have received recent attention [1][2][3][4][5][6][7][8], yet experimental results (i.e., not simulated) on these effects on other logic gates, such as the NAND gate, are negligible. Furthermore, the focus of reliability studies on the inverter logic circuit has involved the detrimental aspects of a circuit level stress on the DC voltage transfer characteristics (VTC) exclusive of circuit response in the time-domain [1,2,7,8].…”
Section: Introductionmentioning
confidence: 99%