Surface Wave Eigenmodes in a Finite-Area Plane Microwave Plasma

Ghanashev, I.; Nagatsu, Masaaki; Sugai, Hideo

doi:10.1143/jjap.36.337

Cited by 94 publications

(99 citation statements)

References 21 publications

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“…A similar feature was observed during operation in the same TM mnl states for MSE plasmas. 13 We can thus infer that in the vicinity of the E→H mode transitions a major portion of the rf input power is gainfully consumed for plasma production and heating.…”

Section: Methodsmentioning

confidence: 97%

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Power transfer and mode transitions in low-frequency inductively coupled plasmas

Ostrikov

2000

Journal of Applied Physics

100

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Operation and mode jumps in low-frequency (500 kHz) radio-frequency inductively coupled plasmas are investigated. The discharge is driven by a flat inductive coil which can excite the electrostatic (E) and electromagnetic (H) discharge modes. The power transfer efficiency and mode transition behavior are studied. It is found that the power reflection coefficient as a function of the input power is minimal in the vicinity of the mode transitions and exhibits hysteresis, which is also observed when the operating gas pressure is varied.

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Section: Methodsmentioning

confidence: 97%

“…1 and 2 one can estimate that the value of P tot required to initiate the transition is approximately 970 W just before the transition, and 1100 W after that. In analogy with the microwave-excited plasma experiments, 11,13 we introduce the rf power reflection coefficient…”

Section: Methodsmentioning

confidence: 99%

Power transfer and mode transitions in low-frequency inductively coupled plasmas

Ostrikov

2000

Journal of Applied Physics

100

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“…There are numerous variations on these planar designs, leading to improved densities, homogeneity, etc. We refer the interested reader to a number of articles for a thorough examination of the various source configurations [15,45,50,55,[63][64][65][66][67][68]. In this case, it is the plasma sustained by standing SWs that is of interest.…”

Section: Plasmas Sustained By Propagating Surface Wavesmentioning

confidence: 99%

“…where γ d and γ p are the inverses of the penetration depths (where γ = −(κ 2 − εω 2 /c 2 ) 1/2 [64]) in a dielectric window and plasma, respectively and d th is the thickness of the dielectric layer. The frequency of resonance may be obtained from [55]:…”

Section: Plasmas Sustained By Standing Surface Wavesmentioning

confidence: 99%

Plasmas meet plasmonics

2012

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Abstract. The term 'plasmon' was first coined in 1956 to describe collective electronic oscillations in solids which were very similar to electronic oscillations/surface waves in a plasma discharge (effectively the same formulae can be used to describe the frequencies of these physical phenomena). Surface waves originating in a plasma were initially considered to be just a tool for basic research, until they were successfully used for the generation of large-area plasmas for nanoscale materials synthesis and processing. To demonstrate the synergies between 'plasmons' and 'plasmas', these large-area plasmas can be used to make plasmonic nanostructures which functionally enhance a range of emerging devices. The incorporation of plasmafabricated metal-based nanostructures into plasmonic devices is the missing link needed to bridge not only surface waves from traditional plasma physics and surface plasmons from optics, but also, more topically, macroscopic gaseous and nanoscale metal plasmas. This article first presents a brief review of surface waves and surface plasmons, then describe how these areas of research may be linked through Plasma Nanoscience showing, by closely looking at the essential physics as well as current and future applications, how everything old, is new, once again.

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“…9 In dielectric-bounded SWP sources, more than 200 W microwave power is injected. [1][2][3][4][5][6][7][8][9][10][11][12] In MVP sources, microwave plasmas are produced along a dielectric-free metal antenna and the surface waves propagate along the plasma-sheath interfaces. In 2005, Kousaka et al 13 at Nagoya University reported a new SWP source which can generate over-dense plasma along the surface of a negative biased metal rod, called metal-antenna surface wave excited plasma (MASWP).…”

Section: Introductionmentioning

confidence: 99%

Microwave power coupling in a surface wave excited plasma

2015

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In recent decades, different types of plasma sources have been used for various types of plasma processing, such as, etching and thin film deposition. The critical parameter for effective plasma processing is high plasma density. One type of high density plasma source is Microwave sheath-Voltage combination Plasma (MVP). In the present investigation, a better design of MVP source is reported, in which over-dense plasma is generated for low input microwave powers. The results indicate that the length of plasma column increases significantly with increase in input microwave power.

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Surface Wave Eigenmodes in a Finite-Area Plane Microwave Plasma

Cited by 94 publications

References 21 publications

Power transfer and mode transitions in low-frequency inductively coupled plasmas

Power transfer and mode transitions in low-frequency inductively coupled plasmas

Plasmas meet plasmonics

Microwave power coupling in a surface wave excited plasma

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