Surface sputtering with nanoclusters: the relevant parameters

Delcorte, Arnaud; Restrepo, Óscar A.; Czerwinski, Bartlomiej; Garrison, B. J.

doi:10.1002/sia.4926

Cited by 11 publications

(15 citation statements)

References 31 publications

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“…From the discussion earlier, it became clear that the damage is reduced when sputtering with low E / n . On the other hand, it has been reported that sputtering yields strongly decrease with decreasing energy/atom. Our experimental data presented in Fig.…”

Section: Resultsmentioning

confidence: 98%

Fundamental aspects of Ar_n⁺ SIMS profiling of common organic semiconductors

Fleischmann

Conard

Havelund

et al. 2014

Surface & Interface Analysis

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We investigate the capabilities and limitations of performing (quantitative) in-depth composition analysis of polymer:fullerene blends, using time-of-flight SIMS with large Ar n + clusters. These blends constitute an important class of organic solar cell materials, whose performance and reliability critically depend on the blend's physicochemical properties at the nanoscale. We investigate the effect of Ar cluster size n, kinetic energy E and E/n on the secondary ion and sputter yields and evaluate the Ar beam-induced damage in these layers. On the basis of this, the ideal experimental conditions are derived that allow us to investigate matrix effects and variations in sputter yields as function of polymer:fullerene compositions. We demonstrate that time-of-flight SIMS is capable to retrieve quantitative in-depth information in common polythiophene, polycarbazole, and fullerene blends. Figure 5. (a) Steady-state ion intensities as function of polymer concentration, demonstrating strong matrix effects. The same trend was observed for the PCDTBT-based mixture. (b) Secondary ion yield ratio [C 4 HS À /(C 4 HS À +PCBM À )] as function of polymer concentration acquired on a PCDTBT-based (squares) and on a P3HT-based (rhombus) mixture.

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Section: Resultsmentioning

confidence: 98%

Fundamental aspects of Ar_n⁺ SIMS profiling of common organic semiconductors

Fleischmann

Conard

Havelund

et al. 2014

Surface & Interface Analysis

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“…The energy per projectile mass (i.e., substantially velocity) is known to be one of the physical parameters affecting the sputtering process and thus the sputtering yields [19][20][21]. The molecular clusters used in this experiment have the same cluster size and total energy (5 keV), but have different masses due to the different masses of the constituent molecules, and therefore different E/m.…”

Section: Resultsmentioning

confidence: 99%

Large Molecular Cluster Formation from Liquid Materials and Its Application to ToF-SIMS

Moritani

Nagata

Tanaka

et al. 2021

QuBS

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Since molecular cluster ion beams are expected to have various chemical effects, they are promising candidates for improving the secondary ion yield of Tof-SIMS. However, in order to clarify the effect and its mechanism, it is necessary to generate molecular cluster ion beams with various chemical properties and systematically examine it. In this study, we have established a method to stably form various molecular cluster ion beams from relatively small amounts of liquid materials for a long time by the bubbling method. Furthermore, we applied the cluster ion beams of water, methanol, methane, and benzene to the primary beam of SIMS and compared the molecular ion yields of aspartic acid. The effect of enhancing the yields of [M+H]+ ion of aspartic acid was found to be the largest for the water cluster and small for the methane and benzene clusters. These results indicate that the chemical effect contributes to the desorption/ionization process of organic molecules by the molecular cluster ion beam.

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“…Delcorte et al . have explored in some detail the sputter yield and fragmentation of molecular species as a function of E/nucleon from large cluster impacts . This work suggests a mechanistic change at an E/nucleon of about 1 eV.…”

Section: Resultsmentioning

confidence: 99%

Mass spectrometric imaging of brain tissue by time-of-flight secondary ion mass spectrometry - How do polyatomic primary beams C₆₀⁺, Ar₂₀₀₀⁺, water-doped Ar₂₀₀₀⁺and (H₂O)₆₀₀₀⁺compare?

Razo

Sheraz

Henderson

et al. 2015

Rapid Commun. Mass Spectrom.

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RationaleTo discover the degree to which water‐containing cluster beams increase secondary ion yield and reduce the matrix effect in time‐of‐flight secondary ion mass spectrometry (TOF‐SIMS) imaging of biological tissue.MethodsThe positive SIMS ion yields from model compounds, mouse brain lipid extract and mouse brain tissue together with mouse brain images were compared using 20 keV C60 +, Ar2000 +, water‐doped Ar2000 + and pure (H2O)6000 + primary beams.ResultsWater‐containing cluster beams where the beam energy per nucleon (E/nucleon) ≈ 0.2 eV are optimum for enhancing ion yields dependent on protonation. Ion yield enhancements over those observed using Ar2000 + lie in the range 10 to >100 using the (H2O)6000 + beam, while with water‐doped (H2O)Ar2000 + they lie in the 4 to 10 range. The two water‐containing beams appear to be optimum for tissue imaging and show strong evidence of increasing yields from molecules that experience matrix suppression under other primary beams.ConclusionsThe application of water‐containing primary beams is suggested for biological SIMS imaging applications, particularly if the beam energy can be raised to 40 keV or higher to further increase ion yield and enhance spatial resolution to ≤1 µm. © 2015 The Authors. Rapid Communications in Mass Spectrometry Published by John Wiley & Sons Ltd.

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Surface sputtering with nanoclusters: the relevant parameters

Cited by 11 publications

References 31 publications

Fundamental aspects of Ar_n⁺ SIMS profiling of common organic semiconductors

Fundamental aspects of Ar_n⁺ SIMS profiling of common organic semiconductors

Large Molecular Cluster Formation from Liquid Materials and Its Application to ToF-SIMS

Mass spectrometric imaging of brain tissue by time-of-flight secondary ion mass spectrometry - How do polyatomic primary beams C₆₀⁺, Ar₂₀₀₀⁺, water-doped Ar₂₀₀₀⁺and (H₂O)₆₀₀₀⁺compare?

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Surface sputtering with nanoclusters: the relevant parameters

Cited by 11 publications

References 31 publications

Fundamental aspects of Arn+ SIMS profiling of common organic semiconductors

Fundamental aspects of Arn+ SIMS profiling of common organic semiconductors

Large Molecular Cluster Formation from Liquid Materials and Its Application to ToF-SIMS

Mass spectrometric imaging of brain tissue by time-of-flight secondary ion mass spectrometry - How do polyatomic primary beams C60+, Ar2000+, water-doped Ar2000+and (H2O)6000+compare?

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Fundamental aspects of Ar_n⁺ SIMS profiling of common organic semiconductors

Fundamental aspects of Ar_n⁺ SIMS profiling of common organic semiconductors

Mass spectrometric imaging of brain tissue by time-of-flight secondary ion mass spectrometry - How do polyatomic primary beams C₆₀⁺, Ar₂₀₀₀⁺, water-doped Ar₂₀₀₀⁺and (H₂O)₆₀₀₀⁺compare?