Surface roughness, mechanical properties and bonding structure of silicon carbon nitride films grown by dual ion beam sputtering

Influence of trimethylsilane flow on the microstructure, mechanical and tribological properties of CrSiCN coatings in water lubrication

“…When the TMS flow was higher than 20 sccm, the binding energies of Si-C-N shifted to high energy and located at 101.5-101.6 eV. As seen in Table 3 that the SiC-like Si-C-N bonds were changed into the Si 3 N 4 -like Si-N-C bonds [50] with an increase in the TMS flow. Fig.…”

“…After doping the silicon atoms into the CrCN coatings, the first peak shifted and located at 282.2-283 eV, which was attributed to C-Cr/C-Si bond [58,59]. When the TMS increased from 15 sccm to 25 sccm, the third peak shifted to high energy and located at 286.1-286.3 eV, which was attributed to sp 3 C-N/C-N bond [17,50]. In addition, the appearance of C-O bond showed that the surface of coatings was contaminated by oxygen from air.…”

“…[50] has reported that the peak at 101.1-101.2 eV was between 100.45 eV (SiC phase) and 101.8 eV (Si 3 N 4 phase), thus the 101.1-101.2 eV bond could be corresponded to Si-C-N bonds. The peak at 102.1-102.5 eV could be attributed to Si-N bond (Si 3 N 4 phase) [50,56]. When the TMS flow was higher than 20 sccm, the binding energies of Si-C-N shifted to high energy and located at 101.5-101.6 eV.…”

Corrosion Behaviour of a SiOxNy Coated and Nitrided PH Stainless Steel

“…This would also mean an increase of the surface hardness and wear resistance of the nitrided layer. The oxides, nitrides, oxynitrides and carbides coatings possess low friction coefficient, high mechanical strength and chemical inertness, according to Faines et al (1997), Zhou et al (2010) and Li et al (2010). There are published results concerning the duplex processes (nitriding plus coating) where good tribological performance of the coating-substrate system, stresses reduction at the interface and improved adhesion have been achieved as reported byZukerman et al (2007), Qi et al (2007), Podgornik et al (2003), Guruvenket et al (2009) andBenkahoul et al (2009).…”

Compilation on Synthesis, Characterization and Properties of Silicon and Boron Carbonitride Films

“…As results are determined h-BCN with stoichiometric formulas B 2 C 3 N (produced without NH 3 ) or B 2 CN 3 (produced with NH 3 ). Thick (20-70 nm) amorphous B x C y N z films were produced by DMAB ((CH 3 ) 2 HN:BH 3 ) in a CVD procedure (Wu et al, 2010). XPS and SIMS were used for the determination of the elemental composition.…”