1995
DOI: 10.1103/physrevb.51.10998
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Surface reconstruction ofErSi1.7(0001) investigated by scanning tunneling microscopy

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Cited by 45 publications
(29 citation statements)
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“…This highly anisotropic character in planes parallel to the surface contrasts with the more isotropic one observed for the (ͱ3ϫͱ3)R30°ErSi 1.7 silicide islands formed at higher coverages ͑Ͼ1 ML͒ that adopt a hexagonal or triangular shape. 7 We suggest that the ͑2ϫ1͒ islands correspond to a form of defected ErSi 1.7 with a ͑2ϫ1͒ as opposed to (ͱ3ϫͱ3)R30°Si vacancy arrangement. Indeed, such a silicide phase is quite similar to the orthorhombic form of ErSi 1.7 observed in bulk with lattice parameters aϭ6.538 Å, bϭ3.793 Å, and cϭ4.082 Å ͑Ref.…”
Section: Resultsmentioning
confidence: 98%
See 1 more Smart Citation
“…This highly anisotropic character in planes parallel to the surface contrasts with the more isotropic one observed for the (ͱ3ϫͱ3)R30°ErSi 1.7 silicide islands formed at higher coverages ͑Ͼ1 ML͒ that adopt a hexagonal or triangular shape. 7 We suggest that the ͑2ϫ1͒ islands correspond to a form of defected ErSi 1.7 with a ͑2ϫ1͒ as opposed to (ͱ3ϫͱ3)R30°Si vacancy arrangement. Indeed, such a silicide phase is quite similar to the orthorhombic form of ErSi 1.7 observed in bulk with lattice parameters aϭ6.538 Å, bϭ3.793 Å, and cϭ4.082 Å ͑Ref.…”
Section: Resultsmentioning
confidence: 98%
“…5 The 2D ErSi 2 and 3D ErSi 1.7 films are formed typically for coverages Ϸ1 ML and Ͼ1 ML, respectively, and are terminated in a very similar fashion with a Si͑111͒ bilayer without Si vacancies. 4,6,7 Yet, up to now very little is known about the Er phases observed in the submonolayer range. Angle-resolved photoemission ͑ARP͒ and scanning tunneling microscopy ͑STM͒ revealed that the 2D ErSi 2 phase grows essentially in a layer-by-layer way in the 0.5-1 ML range when the Er is deposited at room temperature ͑RT͒ and subsequently annealed.…”
Section: Introductionmentioning
confidence: 98%
“…To understand our results we shall refer first to the atomic structure of the ErSi 1.7 epitaxially grown on Si(1 1 1). The interpretation of the atomic configuration was given in terms of two models, the first one was proposed by Roge et al [14,15] and the second one by Martin-Gago et al [16,17]. In the first model, a silicon atom (Si up ) of the first layer (of the surface bilayer) is on top of the vacancy, and it relaxes inward as shown schematically in Fig.…”
Section: A Monolayer Of Ysi 2 On Simentioning
confidence: 99%
“…Although there is a previous theoretical work in the same system, the authors have assumed the so-called BT 4 atomic geometry and optimized it [23]. (2) The growth of a few layers of YSi 1.7 on Si(1 1 1) was studied considering models [14][15][16][17], which have been initially proposed to explain the adsorption of RE elements on Si(1 1 1), but up to now, there are no theoretical calculations for YSi 2 on Si(1 1 1). These models consist of bulk-like Si bilayers without vacancies in the topmost plane.…”
Section: Introductionmentioning
confidence: 99%
“…Silicides of the trivalent rare earth metals grown as thin films on silicon surfaces are currently of high interest because of their low Schottky-barrier heights on n-type substrates [1][2][3][4][5], their epitaxial growth on Si(1 1 1) [6][7][8][9][10][11][12][13][14][15][16][17][18] and the self-organized formation of nanowires on Si(0 0 1) [19][20][21][22][23]. These silicide films can be prepared by rare-earth deposition and subsequent annealing.…”
Section: Introductionmentioning
confidence: 99%